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Klaus Roithner

IBM

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Publication

Featured researches published by Klaus Roithner.

Archive | 1995

Etch profile shaping through wafer temperature control

Karl Paul Muller; Klaus Roithner; Bernhard Poschenrieder; Toru Watanabe

Archive | 1996

Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops

Klaus Roithner; Bernhard Poschenrieder; Karl Paul Muller

Archive | 1996

Pad stack with a poly SI etch stop for TEOS mask removal with RIE

Karl Paul Muller; Bernhard Poschenrieder; Klaus Roithner

Microelectronic Engineering | 1995

Selectivity and Si-load in deep trench etching

K. Paul Muller; Klaus Roithner; Hans-Jörg Timme

Archive | 1998

Fabrication of trench capacitors using disposable hard mask

Matthias Ilg; Richard L. Kleinhenz; Soichi Nadahara; Ronald W. Nunes; Klaus Penner; Klaus Roithner; Radhika Srinivasan; Shigeki Sugimoto

Archive | 1998

Trench etching using borosilicate glass mask

Matthias Ilg; Richard L. Kleinhenz; Soichi Nadahara; Ronald W. Nunez; Klaus Penner; Klaus Roithner; Radhika Srinivasan; Shigeki Sugimoto

Archive | 1995

Enhanced deep trench storage node capacitance for DRAM

Richard L. Kleinhenz; Karl Paul Muller; Klaus Roithner; Masakatsu Tuschiaki

Archive | 2000

Method and apparatus for preventing formation of black silicon on edges of wafers

Dung Ching Perng; David M. Dobuzinsky; Ting Hao Wang; Klaus Roithner

Archive | 1997

Gas distributing plate for reaction chamber

Karl Paul Muller; Bernhard Poschenrieder; Klaus Roithner; パウル ムラー カール; ロイトナー クラウス; ポッシェンリーダー ベルンハルト

Archive | 1997

Distribution plate for a reaction chamber

Karl Paul Muller; Bernhard Poschenrieder; Klaus Roithner

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Karl Paul Muller

IBM

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Bernhard Poschenrieder

Siemens

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Bernhard Poschenrieder

Siemens

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Richard L. Kleinhenz

IBM

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Klaus Penner

IBM

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Matthias Ilg

IBM

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Radhika Srinivasan

IBM

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Shigeki Sugimoto

IBM

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Soichi Nadahara

IBM

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Ronald W. Nunez

IBM

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