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Dive into the research topics where Leonard Rodriguez is active.

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Featured researches published by Leonard Rodriguez.


Journal of Vacuum Science and Technology | 2013

Roughness evolution during the atomic layer deposition of metal oxides

Peter Antony Premkumar; Annelies Delabie; Leonard Rodriguez; Alain Moussa; Christoph Adelmann

The evolution of the surface roughness during the atomic-layer deposition (ALD) of Al2O3, NiO, and HfO2 was studied by atomic-force microscopy and nonspecular x-ray reflectance. The results indicate that the crystallinity of the films played a crucial role in the roughness evolution during ALD. While the ALD of amorphous oxide films showed replication of the initial starting surface with no roughness build-up, the ALD of polycrystalline oxide films led to a strong anomalous dependence of the roughness on the film thickness. This behavior is explained within a model taking into account spatial variations of the adsorption site density.


Chemistry of Materials | 2013

Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

Christoph Adelmann; Daniel Cuypers; Massimo Tallarida; Leonard Rodriguez; Astrid De Clercq; Daniel Friedrich; Thierry Conard; Annelies Delabie; Jin Won Seo; Jean-Pierre Locquet; Stefan De Gendt; Dieter Schmeisser; Sven Van Elshocht; Matty Caymax


ECS Journal of Solid State Science and Technology | 2013

Wet Chemical Etching of InP for Cleaning Applications II. Oxide Removal

D. H. van Dorp; Daniel Cuypers; S. Arnauts; Alain Moussa; Leonard Rodriguez; S. De Gendt


ECS Journal of Solid State Science and Technology | 2014

Study of InP Surfaces after Wet Chemical Treatments

Daniel Cuypers; D. H. van Dorp; Massimo Tallarida; Simone Brizzi; Thierry Conard; Leonard Rodriguez; Maarten Mees; S. Arnauts; Dieter Schmeisser; C. Adelmann; S. De Gendt


Chemical Vapor Deposition | 2012

Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors

Christoph Adelmann; Annelies Delabie; Bart Schepers; Leonard Rodriguez; Alexis Franquet; Thierry Conard; Karl Opsomer; Inge Vaesen; Alain Moussa; Geoffrey Pourtois; Kristine Pierloot; Matty Caymax; Sven Van Elshocht


Semiconductor Cleaning Science and Technology 13 | 2013

Study of InP Surfaces After Wet Chemical Treatments

Daniel Cuypers; Dennis H. van Dorp; Massimo Tallarida; Simone Brizzi; Leonard Rodriguez; Thierry Conard; Sophia Arnauts; Dieter Schmeisser; Christoph Adelmann; Stefan De Gendt


Archive | 2013

Wet Chemical Etching of InP for Cleaning Applications

D. H. van Dorp; Daniel Cuypers; S. Arnauts; Alain Moussa; Leonard Rodriguez; S. De Gendt


Archive | 2014

JSS FOCUS ISSUE ON SEMICONDUCTOR SURFACE CLEANING AND CONDITIONING Study of InP Surfaces after Wet Chemical Treatments

Daniel Cuypers; D. H. van Dorp; Massimo Tallarida; Simone Brizzi; Thierry Conard; Leonard Rodriguez; Maarten Mees; S. Arnauts; Dieter Schmeisser; C. Adelmann; S. De


Archive | 2013

Molecular Layer Deposition of organic-inorganic hybrid materials for implant BARC applications

Leonard Rodriguez; Christoph Adelmann; Ben Sutens; Gustaf Winroth; Annelies Delabie; Roel Gronheid; Sven Van Elshocht


Archive | 2012

In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces

Christoph Adelmann; Massimo Tallarida; Daniel Cuypers; Leonard Rodriguez; Marcel Michling; Daniel Friedrich; Astrid De Clercq; Annelies Delabie; Thierry Conard; Sven Van Elshocht; Jean-Pierre Locquet; Dieter Schmeisser; Matty Caymax

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Daniel Cuypers

Katholieke Universiteit Leuven

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Massimo Tallarida

Brandenburg University of Technology

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Thierry Conard

Katholieke Universiteit Leuven

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Dieter Schmeisser

Brandenburg University of Technology

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Alain Moussa

Katholieke Universiteit Leuven

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Jean-Pierre Locquet

Katholieke Universiteit Leuven

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S. Arnauts

Katholieke Universiteit Leuven

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