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Masahiko Doki

Fujitsu

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Publication

Featured researches published by Masahiko Doki.

Archive | 1992

Plasma process apparatus and plasma processing method

Masahiko Doki; Kiyoshi Ooiwa

Archive | 1991

Method of depositing insulating layer on underlying layer using plasma-assisted cvd process using pulse-modulated plasma

Masahiko Doki; Junya Nakahira; Yuji Furumura

Archive | 1994

In-situ cleaning of plasma treatment chamber

Hirofumi Watatani; Masahiko Doki; Shoji Okuda; Junya Nakahira; Hideaki Kikuchi

Archive | 1988

Silicon carbide barrier between silicon substrate and metal layer

Yuji Furumura; Fumitake Mieno; Takashi Eshita; Kikuo Itoh; Masahiko Doki

Archive | 1997

Method of making a semiconductor device having planarized insulating layer

Koichiro Ohira; Katsuyuki Karakawa; Kazutoshi Izumi; Masahiko Doki

Archive | 1991

Method of forming shallow junctions

Masahiko Doki; Michiko Takei

Archive | 1988

Method of forming shallow junction and semiconductor device having said shallow junction

Masahiko Doki; Michiko Takei

Archive | 1990

Apparatus for and method of processing a semiconductor device using microwave-generated plasma

Masahiko Doki; Kiyoshi Ooiwa

Archive | 1994

Multilayer insulating film of semiconductor device and method for forming the film

Yuji Furumura; Masahiko Doki; Hidetoshi Nishio

symposium on vlsi technology | 1986

Epitaxial SiC Emitter for High Speed Bipolar VLSIs

T. Sugii; Takashi Ito; Yuji Furumura; Masahiko Doki; Fumitake Mieno; Mamoru Maeda

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Collaboration

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Yuji Furumura

Fujitsu

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Fumitake Mieno

Fujitsu

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Junya Nakahira

Fujitsu

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Kiyoshi Ooiwa

Fujitsu

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Kikuo Itoh

Fujitsu

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Takashi Eshita

Fujitsu

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Hidetoshi Nishio

Fujitsu

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Mamoru Maeda

Fujitsu

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Michiko Takei

Fujitsu

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Hirofumi Watatani

Fujitsu

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