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Michael L. Hattendorf

Intel

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Publication

Featured researches published by Michael L. Hattendorf.

Archive | 2006

Method for forming an integrated circuit

Anand S. Murthy; Glenn A. Glass; Andrew N. Westmeyer; Michael L. Hattendorf; Tahir Ghani

Archive | 2006

CMOS transistor junction regions formed by a CVD etching and deposition sequence

Anand S. Murthy; Glenn A. Glass; Andrew N. Westmeyer; Michael L. Hattendorf; Jeffrey R. Wank

Archive | 2005

Angled implantation for removal of thin film layers

Michael L. Hattendorf; Justin K. Brask; Justin S. Sandford; Jack T. Kavalieros; Matthew V. Metz

Archive | 2010

STRAINED NMOS TRANSISTOR FEATURING DEEP CARBON DOPED REGIONS AND RAISED DONOR DOPED SOURCE AND DRAIN

Michael L. Hattendorf; Jack Hwang; Anand S. Murthy; Andrew N. Westmeyer

Archive | 2014

Integrated circuits with selective gate electrode recess

Srijit Mukherjee; Christopher J. Wiegand; Tyler J. Weeks; Mark Y. Liu; Michael L. Hattendorf

Archive | 2006

Formation of strain-inducing films

Anand S. Murthy; Glenn A. Glass; Michael L. Hattendorf

Archive | 2013

Transistor fabrication technique including sacrificial protective layer for source/drain at contact location

Glenn A. Glass; Anand S. Murthy; Michael J. Jackson; Michael L. Hattendorf; Subhash M. Joshi

Archive | 2011

Non-planar transistors and methods of fabrication thereof

Subhash M. Joshi; Michael L. Hattendorf

Archive | 2016

Confined Epitaxial Regions for Semiconductor Devices and Methods of Fabricating Semiconductor Devices Having Confined Epitaxial Regions

Szuya S. Liao; Michael L. Hattendorf; Tahir Ghani

Archive | 2011

Non-planar transitor fin fabrication

Subhash M. Joshi; Michael L. Hattendorf

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Anand S. Murthy

Intel

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Subhash M. Joshi

Intel

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Glenn A. Glass

Intel

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Matthew V. Metz

Northwestern University

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Andrew N. Westmeyer

Intel

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Jack Hwang

Intel

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Michael K. Harper

Intel

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Pragyansri Pathi

Intel

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Andrew Beaverton Westmeyer

Intel

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Christopher J. Wiegand

Intel

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