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Andrew Beaverton Westmeyer

Intel

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Publication

Featured researches published by Andrew Beaverton Westmeyer.

Archive | 2004

Metal gate transistors with epitaxial source and drain regions

Nick Lindert; Justin K. Brask; Andrew Beaverton Westmeyer

Archive | 2008

Metal gate transistors with raised source and drain regions formed on heavily doped substrate

Nick Lindert; Justin K. Brask; Andrew Beaverton Westmeyer

Archive | 2009

Semiconductor device and its usage method

Michael L. Hattendorf; Jack Hwang; Anand S. Murthy; Andrew Beaverton Westmeyer

Archive | 2006

CMOS Transistsorübergangsbereiche, die durch ein CVD Ätzen gebildet sind und Ablagerungsabfolge CMOS Transistsorübergangsbereiche formed by a CVD etching and deposition sequence

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2006

Herstellungsverfahren für CMOS Transistsorübergangsbereiche, die durch ein CVD Ätzen gebildet sind und eine Ablagerungsabfolge in ein und derselben Kammer A method for manufacturing CMOS Transistsorübergangsbereiche formed by a CVD deposition and etching sequence in one and the same chamber

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2006

CMOS Transistsorübergangsbereiche, die durch ein CVD Ätzen gebildet sind und Ablagerungsabfolge

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2006

Herstellungsverfahren für CMOS Transistsorübergangsbereiche, die durch ein CVD Ätzen gebildet sind und eine Ablagerungsabfolge in ein und derselben Kammer

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2006

CMOS Transistsorübergangsbereiche formed by a CVD etching and deposition sequence

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2006

Manufacturing method for CMOS Transistsorübergangsbereiche formed by a CVD etching and deposition sequence in one and the same chamber

Glenn Beaverton Glass; Michael Aloha Hattendorf; Anand Portland Murthy; Jeffrey Tigard Wank; Andrew Beaverton Westmeyer

Archive | 2005

Verfahren zur Herstellung von Metallgate-Transistoren mit epitaktischen Source- und Drainregionen und MOS-Transistor

Justin Portland Brask; Nick Lindert; Andrew Beaverton Westmeyer

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Collaboration

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Nick Lindert

Intel

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Anand Portland Murthy

Intel

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Glenn Beaverton Glass

Intel

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Jeffrey Tigard Wank

Intel

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Michael Aloha Hattendorf

Intel

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Justin Portland Brask

Intel

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Justin K. Brask

Intel

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Anand S. Murthy

Intel

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Jack Hwang

Intel

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Michael L. Hattendorf

Intel

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