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Dive into the research topics where Michael S. Cox is active.

Publication


Featured researches published by Michael S. Cox.


Archive | 2002

Toroidal plasma source for plasma processing

Michael S. Cox; Canfeng Lai; Robert B. Majewski; David Wanamaker; Christopher T. Lane; Peter K. Loewenhardt; Shamouil Shamouilian; John Parks


Archive | 2003

Sequential gas flow oxide deposition technique

Farhad Moghadam; Michael S. Cox; Padmanabhan Krishnaraj; Thanh Pham


Archive | 2002

Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas

Shamouil Shamouilian; Canfeng Lai; Michael S. Cox; Padmanabhan Krishnaraj; Tsutomu Tanaka; Sebastien Raoux; Peter I. Porshnev; Thomas Nowak


Archive | 2004

Multi-core transformer plasma source

Canfeng Lai; Michael S. Cox; Peter K. Loewenhardt; Tsutomu Tanaka; Shamouil Shamouilian


Archive | 2005

In situ application of etch back for improved deposition into high-aspect-ratio features

Padmanabhan Krishnaraj; Pavel Ionov; Canfeng Lai; Michael S. Cox; Shamouil Shamouilian


Archive | 2006

Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure

Mihaela Balseanu; Michael S. Cox; Li-Qun Xia; Mei-Yee Shek; Jia Lee; Vladimir Zubkov; Tzu-Fang Huang; Rongping Wang; Isabelita Roflox; Hichem M'Saad


Archive | 2000

Directing a flow of gas in a substrate processing chamber

Laxman Murugesh; Padmanaban Krishnaraj; Michael S. Cox; Canfeng Lai; Narendra Dubey; Tom K. Cho; Sudhir Gondhalekar; Lily L. Pang


Archive | 2003

Gapfill process using a combination of spin-on-glass deposition and chemical vapor deposition techniques

Zhenjiang Cui; Rick J. Roberts; Michael S. Cox; Jun Zhao


Archive | 2001

Atmospheric substrate processing apparatus for depositing multiple layers on a substrate

Michael Barnes; Michael S. Cox; Canfeng Lai; John Parks


Archive | 2002

Deposition process for high aspect ratio trenches

Farhad Moghadam; Michael S. Cox; Padmanabhan Krishnaraj; Thanh Pham; Zhenjiang Cui

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