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Miyako Yamasaka

Tokyo Electron

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Publication

Featured researches published by Miyako Yamasaka.

Archive | 1997

Method for washing and drying substrates

Miyako Yamasaka

Archive | 1999

Liquid treatment method and apparatus

Naoki Shindo; Miyako Yamasaka; Yuji Kamikawa

Archive | 1997

Method for wet etching of thin film

Hiroki Taniyama; Miyako Yamasaka; Hiroyuki Kudou; Akira Yonemizu

Archive | 2000

Cleaning method and cleaning equipment

Yuji Kamikawa; Naoki Shindo; Shigenori Kitahara; Miyako Yamasaka

Archive | 1997

Method for processing through wafer rotation and its device

Hiroyuki Kudo; Hiromi Taniyama; Miyako Yamasaka; Akira Yonemizu; 都 山坂; 裕幸 工藤; 昭 米水; 博己 谷山

Archive | 2001

Method and apparatus of processing surface of substrate

Takayuki Toshima; Miyako Yamasaka

Archive | 2007

Substrate processing apparatus for resist film removal

Takayuki Toshima; Kinya Ueno; Miyako Yamasaka; Hideyuki Tsutsumi; Tadashi Iino; Yuji Kamikawa

china semiconductor technology international conference | 2012

Single Wafer Wet Clean Challenges and Solution for 32nm

Takayuki Toshima; Shouuichi Nishikido; Miyako Yamasaka; Kang Suni

Archive | 2000

Method for processing substrate, e.g. semiconductor wafer comprises arranging substrate in processing vessel, forming layer of solvent over surface of substrate, and dissolving an operating gas in layer of solvent

Takayuki Toshima; Kinya Ueno; Miyako Yamasaka; Hideyuki Tsutsumi; Tadashi Iino; Yuji Kamikawa

Archive | 2001

Substrate treatment method and substrate treater

Tadashi Iino; Yuji Kamikawa; Takayuki Toshima; Hideyuki Tsutsumi; Kinya Ueno; Miyako Yamasaka

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Collaboration

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Yuji Kamikawa

Tokyo Electron

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Takayuki Toshima

Tokyo Electron

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Hideyuki Tsutsumi

Tokyo Electron

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Tadashi Iino

Tokyo Electron

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Kinya Ueno

Tokyo Electron

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Naoki Shindo

Tokyo Electron

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Akira Yonemizu

Tokyo Electron

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Shigenori Kitahara

Tokyo Electron

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Hiroki Taniyama

Tokyo Electron

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Hiroyuki Kudou

Tokyo Electron

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