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Dive into the research topics where N. Ramungul is active.

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Featured researches published by N. Ramungul.


Solid-state Electronics | 2000

SiC and GaN bipolar power devices

T.P. Chow; V. Khemka; J. Fedison; N. Ramungul; K. Matocha; Yi Tang; Ronald J. Gutmann

Abstract The present status of the silicon carbide and gallium nitride bipolar power semiconductor devices is reviewed. Several unipolar and bipolar figures of merit have been examined to demonstrate the potential performance gain to be obtained from silicon carbide and gallium nitride based power devices. Several conventional as well as novel device structures have been examined, some of which have already been demonstrated and others are in their early stages of development. Conventional silicon theory has often been found to be inadequate to explain the characteristics of silicon carbide. Appropriate modifications have been applied to investigate more complicated characteristics of silicon carbide devices.


international symposium on power semiconductor devices and ic s | 1998

Phosphorus-implanted high-voltage n/sup +/p 4H-SiC junction rectifiers

R. Patel; V. Khemka; N. Ramungul; T.P. Chow; M. Ghezzo; J.W. Kretchmer

In this paper, we report the fabrication and characterization of phosphorus-implanted 4H-SiC n/sup +//p junction rectifiers. Sheet resistance measurements of the implanted layers indicated values as low as 160 /spl Omega///spl square/. The forward characteristics of these diodes obey a generalized Shockley-Noyce-Sah (SNS) multiple-trap recombination model with 4 shallow levels and 1 deep level. Close-to-ideal avalanche breakdown voltage with a positive temperature coefficient is observed. The high-level injection lifetime has been extracted to characterize the switching behaviour of these diodes.


international symposium on power semiconductor devices and ic s | 1999

Static and dynamic characteristics of a 1100 V, double-implanted, planar, 4H-SiC PiN rectifier

V. Khemka; R. Patel; N. Ramungul; T.P. Chow; Ronald J. Gutmann

Implanted, high-voltage, planar junction rectifiers in 4H-SiC are fabricated using a deep boron implanted junction along with a shallow heavily doped layer created by co-implantation of aluminum and carbon. The fabricated junctions can block up to about 1100 V with low forward drop and low leakage current. The static and dynamic characteristics of these rectifiers have been investigated at both room temperature and high temperature.


international symposium on power semiconductor devices and ic s | 1998

Current-controlled negative resistance (CCNR) in SiC P-i-N rectifiers

N. Ramungul; T.P. Chow

This paper presents an experimental demonstration of a current-controlled negative resistance (CCNR) in the forward characteristics of 6H-SiC P-i-N rectifiers. These forward characteristics indicate that the poor electrical performance of SiC diodes arises because conductivity modulation is not yet established. The cause of this behaviour appears to be high defect densities and low minority carrier lifetime in the lightly doped drift region. N/sup +/P junctions exhibit excellent forward characteristics with forward drop of 2.8 V at 100 A/cm/sup 2/ and 3.9 V at 1000 A/cm/sup 2/ without entering the CCNR mode when traps have been filled prior to the measurement.


Journal of Electronic Materials | 1999

Characterization of phosphorus implantation in 4H-SiC

V. Khemka; R. Patel; N. Ramungul; T.P. Chow; Mario Ghezzo; James W. Kretchmer


Materials Science Forum | 1998

Carrier Lifetime Extraction from a 6H-SiC High Voltage p-i-n Rectifier Reverse Recovery Waveform

N. Ramungul; V. Khemka; T. Paul Chow; Mario Ghezzo; James W. Kretchmer


Solid-state Electronics | 1998

Comparison of aluminum- and boron-implanted vertical 6H-SiC p+n junction diodes

N. Ramungul; V. Khemka; R. Tyagi; T.P. Chow; Mario Ghezzo; P.G. Neudeck; James W. Kretchmer; William Andrew Hennessy; Dale M. Brown


Materials Science Forum | 1998

Interface States and Field-Effect Mobility in 6H-SiC MOS Transistors

Emil Arnold; N. Ramungul; T. Paul Chow; Mario Ghezzo


Materials Science Forum | 1998

Beryllium-Implanted 6H-SiC P+N Junctions

N. Ramungul; Yan Jun Zheng; R. Patel; V. Khemka; T. Paul Chow


Materials Science Forum | 2000

Al/C/B Co-Implanted High-Voltage 4H-SiC PiN Junction Rectifiers

Jeffery B. Fedison; Z. Li; V. Khemka; N. Ramungul; T. Paul Chow; Mario Ghezzo; James W. Kretchmer; Ahmed Elasser

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V. Khemka

Rensselaer Polytechnic Institute

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T. Paul Chow

Rensselaer Polytechnic Institute

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T.P. Chow

Rensselaer Polytechnic Institute

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R. Patel

Rensselaer Polytechnic Institute

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Ronald J. Gutmann

Rensselaer Polytechnic Institute

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Yi Tang

Rensselaer Polytechnic Institute

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