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Oliver Dier

Carl Zeiss AG

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Publication

Featured researches published by Oliver Dier.

Archive | 2012

Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement

Udo Dinger; Frederik Bijkerk; Muharrem Bayraktar; Oliver Dier

Archive | 2012

Coating for producing an optical element having a substrate, whose surface has optically active coating, comprises e.g. placing substrate in substrate plane, generating ions, and deflecting ions moving toward substrate by an electric field

Oliver Dier; Hartmut Enkisch

Archive | 2016

SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING

Oliver Dier; Tobias Hackl; Franz-Josef Stickel; Ulrich Löring; Tilmann Aßmus; Jürgen Müller; Vladimir Kamenov; Siegfried Rennon

Archive | 2015

Reflective optical element, and optical system of a microlithographic projection exposure system

Hartmut Enkisch; Hans-Jochen Paul; Thomas Schicketanz; Oliver Dier; Joern Weber; Christian Grasse; Ralf Winter; Sebastian Strobel

Archive | 2014

EUV-Spiegel und optisches System mit EUV-Spiegel

Thomas Schicketanz; Oliver Dier; Sebastian Strobel; Ralf Winter

Archive | 2013

EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT AND ASSOCIATED OPERATING METHOD

Udo Dinger; Frederik Bijkerk; Muharrem Bayraktar; Oliver Dier

Archive | 2013

Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels

Oliver Dier

Archive | 2012

Mirror for the euv wavelength range, method for producing such a mirror, projection lens for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection lens

Oliver Dier; Hartmut Enkisch; Stephan Müllender; Jörn Weber

Archive | 2013

Method and arrangement for determining the heating condition of a mirror in an optical system

Peter Vogt; Martin Hermann; Oliver Dier; András G. Major

Archive | 2018

OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Hartmut Enkisch; Thomas Schicketanz; Matus Kalisky; Oliver Dier

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Collaboration

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Hartmut Enkisch

Carl Zeiss AG

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Thomas Schicketanz

Carl Zeiss AG

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András G. Major

Carl Zeiss AG

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Martin Hermann

Carl Zeiss AG

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Peter Vogt

Carl Zeiss AG

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Ralf Winter

Carl Zeiss AG

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Sebastian Strobel

Carl Zeiss AG

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Udo Dinger

Carl Zeiss AG

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Frederik Bijkerk

MESA+ Institute for Nanotechnology

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Muharrem Bayraktar

MESA+ Institute for Nanotechnology

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