Paul M. Feeney
IBM
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Featured researches published by Paul M. Feeney.
Meeting Abstracts | 2010
Jeffrey Dysard; Vlasta Brusic; Paul M. Feeney; Steven Grumbine; Kevin Moeggenborg; Glenn Whitener; William Ward; Gregory Burns; Kyose Choi
In order to enable high-k metal gate technology, new CMP steps and slurries are needed to meet the stringent planarity and defect requirements for device performance. This paper will describe several of these slurry technologies in detail, including poly-open-polish, Aluminum CMP, and improvements required in Tungsten polishing. The keys to these technologies are outlined and polishing performance given in detail. The critical mechanisms involved in the material polishing for each of these steps are also introduced. All of these new technologies are needed in order to build a successful high-k metal gate device for advanced node integration via a replacement gate build strategy.
Archive | 2002
Donald F. Canaperi; William J. Cote; Paul M. Feeney; Mahadevaiyer Krishnan; Joyce C. Liu; Michael F. Lofaro; Philip Murphy; Eric J. White
Archive | 2005
Paul M. Feeney; Vlasta Brusic
Archive | 2000
John J. Ellis-Monaghan; Paul M. Feeney; Robert M. Geffken; Howard S. Landis; Rosemary A. Previti-Kelly; Bette L. Bergman Reuter; Matthew J. Rutten; Anthony K. Stamper; Sally J. Yankee
Archive | 2001
Paul M. Feeney; Timothy C. Krywanczyk; Lawrence Daniel David; Matthew T. Tiersch; Eric J. White
Archive | 2000
Susan G. Bombardier; Paul M. Feeney; Robert M. Geffken; David V. Horak; Matthew J. Rutten
Archive | 1999
Vlasta Brusic; Daniel C. Edelstein; Paul M. Feeney; William L. Guthrie; Mark A. Jaso; Frank B. Kaufman; Naftali E. Lustig; Peter Roper; Kenneth P. Rodbell; David B. Thompson
Archive | 2001
Jonathan D. Chapple-Sokol; Paul M. Feeney; Robert M. Geffken; David V. Horak; Mark P. Murray; Anthony K. Stamper
Archive | 2006
Vlasta Brusic; Renjie Zhou; Paul M. Feeney; Christopher Thompson
Archive | 2001
John J. Ellis-Monaghan; Paul M. Feeney; Robert M. Geffken; Howard S. Landis; Rosemary A. Previti-Kelly; Bette L. Bergman-Reuter; Matthew J. Rutten; Anthony K. Stamper; Sally J. Yankee
