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Peter Hübler

Advanced Micro Devices

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Publication

Featured researches published by Peter Hübler.

Archive | 2002

Metallization process sequence for a barrier metal layer

Volker Kahlert; Frank Koschinsky; Peter Hübler

Archive | 2002

Void formation monitoring in a damascene process

Thomas Werner; Peter Hübler; Frank Koschinsky

Archive | 2002

Interface void monitoring in a damascene process

Eckhard Langer; Frank Koschinsky; Volker Kahlert; Peter Hübler

Archive | 2005

Metalleitung mit einer erhöhten Widerstandsfähigkeit gegen Elektromigration entlang einer Grenzfläche einer dielektrischen Barrierenschicht mittels Implantieren von Material in die Metalleitung

H.-J. Engelmann; Ehrenfried Zschech; Peter Hübler

Archive | 2003

Metallization process sequence

Volker Kahlert; Frank Koschinsky; Peter Hübler

Archive | 2003

A method of manufacturing a metal pipe with an increased resistance to electromigration along a boundary surface of a dielectric barrier layer by implanting material into the metal line

Hans-Jürgen Engelmann; Ehrenfried Zschech; Peter Hübler

Archive | 2003

Verfahren zur Herstellung einer Metallleitung mit einer erhöhten Widerstandsfähigkeit gegen Elektromigration entlang einer Grenzfläche einer dielektrischen Barrierenschicht mittels Implantieren von Material in die Metalleitung A method of manufacturing a metal pipe with an increased resistance to electromigration along a boundary surface of a dielectric barrier layer by implanting material into the metal line

Hans-Jürgen Engelmann; Peter Hübler; Ehrenfried Zschech

Archive | 2003

Metalleitung mit einer erhöhten Widerstandsfähigkeit gegen Elektromigration entlang einer Grenzfläche einer dielektrischen Barrierenschicht mittels Implantieren von Material in die Metalleitung Metal line with an increased resistance to electromigration along a boundary surface of a dielectric barrier layer by implanting material into the metal line

Hans-Jürgen Engelmann; Peter Hübler; Ehrenfried Zschech

Archive | 2001

Grenzflächenhohlraumüberwachung in einem Damaszener-Prozess Interfacial cavity monitoring in a damascene process

Peter Hübler; Volker Kahlert; Frank Koschinsky; Eckhard Langer

Archive | 2001

Überwachung der Void-Bildung in einem Damascence-Prozess

Peter Hübler; Frank Koschinsky; Thomas Werner

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Collaboration

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Frank Koschinsky

Advanced Micro Devices

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Ehrenfried Zschech

Advanced Micro Devices

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Volker Kahlert

Advanced Micro Devices

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Thomas Werner

Advanced Micro Devices

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Hans-Jürgen Engelmann

GlobalFoundries

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Eckhard Langer

Advanced Micro Devices

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H.-J. Engelmann

Advanced Micro Devices

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