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Philip M. Salzman

Applied Materials

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Publication

Featured researches published by Philip M. Salzman.

Archive | 1997

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

Gerald Zheyao Yin; Diana Xiaobing Ma; Peter K. Loewenhardt; Philip M. Salzman; Allen Zhao; Hiroji Hanawa

Archive | 1994

Wafer handling within a vacuum chamber using vacuum

Sasson Somekh; Philip M. Salzman; Oskar U. Vierny

Archive | 1996

Enclosure for load lock interface

Philip M. Salzman

Archive | 2001

Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma

Peter K. Loewenhardt; Gerald Zheyao Yin; Philip M. Salzman

Archive | 1997

Process gas inlet and distribution passages

Philip M. Salzman

Archive | 1995

Ceramic dome temperature control using heat pipe structure and method

Shannon J. Kelsey; Philip M. Salzman

Archive | 1996

Magnetically confined plasma reactor for processing a semiconductor wafer

Peter K. Loewenhardt; Gerald Zheyao Yin; Philip M. Salzman

Archive | 1995

Apparatus and methods for processing substrates

Sasson Somekh; Philip M. Salzman; Oskar U. Vierny

Archive | 1995

A processing chamber gas distribution manifold

Philip M. Salzman

Archive | 1997

Plasma reactors for processing substrates

Hiroji Hanawa; Gerald Zheyao Yin; Diana M. Ma; Philip M. Salzman; Peter K. Loewenhardt; Allen Zhao

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Collaboration

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Gerald Zheyao Yin

Applied Materials

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Peter K. Loewenhardt

Applied Materials

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Allen Zhao

Applied Materials

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Hiroji Hanawa

Applied Materials

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Diana Xiaobing Ma

Applied Materials

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Oskar U. Vierny

Applied Materials

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Sasson Somekh

Applied Materials

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Diana M. Ma

Applied Materials

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Dennis S. Grimard

Applied Materials

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Kartik Ramaswamy

Applied Materials

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