Ezra Robert Gold

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

TWIN CHAMBER PROCESSING SYSTEM

Method and apparatus for controlling gas flow to a processing chamber

Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters

Method to reduce plasma-induced charging damage

Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters

Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content

Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation

Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones

Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity