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Dive into the research topics where Sergey G. Belostotskiy is active.

Publication


Featured researches published by Sergey G. Belostotskiy.


IEEE Transactions on Plasma Science | 2014

Race Track Formation in a Magnetically Enhanced Hollow Cathode Electron Source

Leonid Dorf; Ming-Feng Wu; Shahid Rauf; Kenneth S. Collins; Gonzalo Antonio Monroy; Sergey G. Belostotskiy

Immersing a hollow cathode into a magnetic field enhances trapping of fast cathode electrons and ionization, providing ~30% decrease in the discharge voltage for a given current. The nonuniform magnetic field in our electron source causes an intricate visual phenomenon-formation of bright plasma cords (race tracks) near two opposite walls, in a region, where the field component parallel to the walls is the strongest.


Archive | 2013

MULTI-MODE ETCH CHAMBER SOURCE ASSEMBLY

Sergey G. Belostotskiy; Alexander Marcacci; Kartik Ramaswamy; Srinivas D. Nemani; Andrew Nguyen; Yogananda Sarode


Archive | 2014

METHOD OF PATTERNING A SILICON NITRIDE DIELECTRIC FILM

Srinivas D. Nemani; Qingjun Zhou; Dmitry Lubomirsky; Sergey G. Belostotskiy


Archive | 2013

NEAR SURFACE ETCH SELECTIVITY ENHANCEMENT

Lina Zhu; Sean S. Kang; Srinivas D. Nemani; Sergey G. Belostotskiy


Archive | 2013

Pressure controller configuration for semiconductor processing applications

Sergey G. Belostotskiy; Andrew Nguyen; Jonathan Dinh; Ying-sheng Lin


Archive | 2014

METHOD OF PATTERNING A LOW-K DIELECTRIC FILM

Srinivas D. Nemani; Qingjun Zhou; Dmitry Lubomirsky; Sergey G. Belostotskiy


Archive | 2012

Process chamber for etching low k and other dielectric films

Dmitry Lubomirsky; Srinivas D. Nemani; Ellie Yieh; Sergey G. Belostotskiy


Archive | 2011

TEMPERATURE ENHANCED ELECTROSTATIC CHUCKING IN PLASMA PROCESSING APPARATUS

Sergey G. Belostotskiy; Michael G. Chafin; Jingbao Liu; David Palagashvili


Archive | 2015

Temperature ramping using gas distribution plate heat

Sergey G. Belostotskiy; Chinh Dinh; Qingjun Zhou; Srinivas D. Nemani; Andrew Nguyen


Archive | 2014

Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment

Sergey G. Belostotskiy; Chinh Dinh; Andrew Nguyen; Michael G. Chafin

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