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Dive into the research topics where Shunji Moribe is active.

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Featured researches published by Shunji Moribe.


Journal of The Electrochemical Society | 1992

Photochemical Characterization of the Surface Oxide Films of Al‐Pd‐Si and Al‐Si

Yasushi Koubuchi; Shunji Moribe; Yukio Tanigaki; Tokio Kato; Masahisa Inagaki; Jin Onuki

The effect of Pd addition to the Al alloy on the photoelectrochemical response is described. The oxide films are characterized by photoelectrochemical methods. The addition of Pd decreases the photocurrent during illumination. The properties of the surface oxide films on thin Al‐Pd‐Si and Al‐Si alloy films are discussed. The surface oxide film property is related to the increased corrosion resistance of Al‐Pd‐Si. A model of the aluminum oxide film structure on the Al‐Pd‐Si film is also proposed.


Archive | 1995

Semiconductor device having a polycrystalline silicon film with crystal grains having a uniform orientation

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura


Archive | 1996

Semiconductor device and method for mfg. same

Hideo Miura; Shunji Moribe; Kato Hisayuki


Archive | 1995

Semiconductor device using a polysilicium thin film and production thereof

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura


Archive | 1995

Halbleiteranordnung mit einer dünnen Polysilicium-Schicht und Verfahren zur Herstellung

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura


Archive | 2001

Process for producing semiconductor device having crystallized film formed from deposited amorphous film

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura


Archive | 1995

Semiconductor device using a polysilicon thin film and method for fabrication thereof

Shuji Ikeda; Hisayuki Kato; Atsuyoshi Koike; Hideo Miura; Shunji Moribe; Asao Nishimura


Archive | 1995

A process for producing a thin film electrode of a semiconductor device

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura


Archive | 1995

Halbleiteranordnung mit einer dünnen Polysiliziumschicht und Vefahren zur Herstellung

Shuji Ikeda; Hisayuki Kato; Atsuyoshi Koike; Hideo Miura; Shunji Moribe; Asao Nishimura


Archive | 1995

Verfahren zur Herstellung einer Dünnschichtelektrode eines Halbleiterbauteils A process for producing a thin film electrode of a semiconductor device

Hideo Miura; Shunji Moribe; Hisayuki Kato; Atsuyoshi Koike; Shuji Ikeda; Asao Nishimura

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