Silvia Lucherini

An Integrated CAD Methodology for Yield Enhancement of VLSI CMOS Circuits Including Statistical Device Variations

In this paper a novel CAD methodology for yield enhancement of VLSI CMOS circuits including random device variations is presented. The methodology is based on a preliminary characterization of the technological process by means of specific test chips for accurate mismatch modeling. To this purpose, a very accurate position-dependent parameter mismatch model has been formulated and extracted. Finally a CAD tool implementing this model has been developed. The tool is fully integrated in an environment of existing commercial tools and it has been experimented in the STMicroelectronics Flash Memory CAD Group.As an example of application, a bandgap reference circuit has been considered and the results obtained from simulations have been compared with experimental data. Furthermore, the methodology has been applied to the read path of a complex Flash Memory produced by STMicroelectronics, consisting of about 16,000 MOSFETs. Measurements of electrical performances have confirmed the validity of the methodology, and the accuracy of both the mismatch model and the simulation flow.

A new methodology for the statistical analysis of VLSI CMOS circuits and its application to flash memories

In this paper a new CAD methodology for the statistical analysis of VLSI CMOS circuits is presented. A novel very accurate position-dependent mismatch model has been implemented into a complete CAD tool. The tool is fully integrated in an environment of commercial tools and it has been experimented on in the Flash Memory CAD Group in STMicroelectronics. As an example of application, a bandgap test circuit has been considered and the results have been compared with experimental data. This methodology has also been applied to the read path of a complex flash memory produced by STMicroelectronics, consisting of about 16,000 MOSFETs. Measurements of electrical performances have confirmed the accuracy of the proposed simulation flow and models.