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Stephan Back

Carl Zeiss AG

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Publication

Featured researches published by Stephan Back.

Archive | 2012

Lens module comprising at least one exchangeable optical element

Guido Soyez; Stephan Back; Joachim Buechele; Julian Kaller; Guido Limbach; Harald Woelfle

Archive | 2006

Optical system i.e. projection lens, for use in microlithography, has housing including two individual housing parts provided with optical unit, where flushing gas e.g. neon, flows via inlet opening into housing

Stephan Back; Cornelia Bühler; Julian Kaller; Alexander Kohl; Thomas Petasch; Johannes Rau

Archive | 2005

Monitoring element for lithographic projection systems

Stephan Back; Guido Soyez; Joachim Büchele

Archive | 2008

Method for setting an optical imaging property in a microlithographic projection exposure apparatus, and projection exposure apparatus of this type

Stephan Back; Guido Soyez; Joachim Buechele; Annette Muehlpfordt

Archive | 2006

Rinse method for use in the interior of the projection objective casing of a microlithography unit in which sensors are provided in the rinse gas circuit for the detection of harmful impurities in the rinse gas

Stephan Back; Frank Marianek; Detlev Müller; Otto Hahnemann

Archive | 2015

Leichtgewicht-spiegel und projektionsbelichtungsanlage mit einem derartigen spiegel

Rolf Freimann; Stephan Back

Archive | 2014

Lightweight mirrors and projection exposure system with such a mirror

Rolf Freimann; Stephan Back

Archive | 2006

Dispositif d’imagerie dans une machine d’exposition par projection

Stephan Back; Wolfgang Hummel; Juergen Fischer; Karl-Eugen Aubele; Erich Merz; Raoul Reiner; Klaus Rief; Stefan Schoengart; Markus Neumaier; Baerbel Schwaer; Ulrich Weber; Michael Muehlbeyer; Hubert Holderer; Alexander Kohl; Jochen Weber; Johannes Lippert; Thorsten Rassel

Archive | 2006

Microlithographic projection exposure apparatus and method for setting an optical imaging property thereof

Stephan Back; Guido Soyez; Joachim Buechele; Annette Muehlpfordt

Archive | 2006

Mikrolithographische projektionsbelichtungsanlage und verfahren zur einstellung einer optischen abbildungseigenschaft derselben

Stephan Back; Guido Soyez; Joachim Buechele; Annette Muehlpfordt

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Collaboration

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Guido Soyez

Carl Zeiss AG

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Joachim Buechele

Carl Zeiss AG

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Annette Muehlpfordt

Carl Zeiss AG

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Julian Kaller

Carl Zeiss AG

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Alexander Kohl

Carl Zeiss AG

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Guido Limbach

Carl Zeiss AG

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Harald Woelfle

Carl Zeiss AG

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Rolf Freimann

Carl Zeiss AG

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Baerbel Schwaer

Carl Zeiss AG

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Cornelia Bühler

Carl Zeiss AG

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