Is this you? Create Your Porfile
Avatar

Guido Limbach

Carl Zeiss AG

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Guido Limbach is active.

Explore More

Publication

Featured researches published by Guido Limbach.

Archive | 2013

EUV Exposure Apparatus

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2009

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Guido Limbach; Franz Sorg; Armin Schoeppach; Ulrich Weber; Ulrich Loering; Dirk Hellweg; Peter Meyer; Stefan Xalter; Jens Kugler; Bernhard Gellrich; Stefan Hembacher; Bernhard Geuppert; Aksel Goehnermeier

Archive | 2005

Optical element unit for exposure processes

Bernhard Gellrich; Jens Kugler; Guido Limbach; Julian Kaller; Hans Jürgen Scherle; Dieter Schmerek; Detlev Müller; Thomas Schletterer

Archive | 2012

Lens module comprising at least one exchangeable optical element

Guido Soyez; Stephan Back; Joachim Buechele; Julian Kaller; Guido Limbach; Harald Woelfle

Archive | 2007

Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner

Bernhard Gellrich; Bernhard Geuppert; Aksel Göhnermeier; Dirk Hellweg; Stefan Hembacher; Jens Kugler; Guido Limbach; Ulrich Loering; Peter Meyer; Armin Schöppach; Franz Sorg; Ulrich Weber; Stefan Xalter

Archive | 2009

Method and Device for Replacing Objective Parts

Bernhard Geuppert; Guido Limbach; Harald Woelfle; Peter Deufel

Archive | 2013

OPTICAL MODULE WITH A MEASURING DEVICE

Armin Schoeppach; Stefan Hembacher; Guido Limbach; Jens Kugler

Archive | 2009

Projection exposure system for manufacturing semiconductor component i.e. computer chip, has changing unit for changing optical assembly that is exchangeably formed, and bearing unit reducing deformations of optical element caused by holder

Armin Schöppach; Stefan Hembacher; Guido Limbach; Thomas Petasch; Yim-Bun-Patrick Kwan; Viktor Kulitsky; Christian Brusch; Ulrich Weber; Stefan Xalter; Martin Vogt; Bruno Schweizer

Archive | 2011

Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective

Rolf Freimann; Norman Baer; Guido Limbach; Thure Boehm; Gero Wittich

Archive | 2008

Optical element module with imaging error and position correction

Bernhard Gellrich; Jens Kugler; Guido Limbach

Explore More

Collaboration

Dive into the Guido Limbach's collaboration.

Top Co-Authors
Avatar

Bernhard Geuppert

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Jens Kugler

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Stefan Hembacher

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Bernhard Gellrich

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Gero Wittich

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Norman Baer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Ulrich Loering

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Peter Deufel

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Stefan Xalter

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Ulrich Weber

Carl Zeiss AG

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge