Takeyuki Mizutani
Nikon
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Publication
Featured researches published by Takeyuki Mizutani.
Optical Microlithography XVI | 2003
Soichi Owa; Yukako Matsumoto; Yasuhiro Ohmura; Shigeru Sakuma; Takashi Aoki; Jin Nishikawa; Hiroyuki Nagasaka; Takeyuki Mizutani; Naomasa Shiraishi; Kazuhiro Kido; Issei Tanaka; Jun Nagatsuka
Present status of development of F2 (157nm) exposure tool in Nikon is described. Key points of F2 exposure tool are reported; low aberration projection optics, CaF2 quality, coating durability and gas purging of the pellicle space. We also report the measurement of refractive index inhomogeneity inside CaF2 crystals, which is suspected as the cause of local flare. Characteristics of high NA optics over 0.9 are investigated by imaging simulations for both 193nm and 157nm wavelengths, which are compared NA=0.85 imaging.
Archive | 2007
Yuichi Shibazaki; Takeyuki Mizutani; Go Ichinose; Makoto Shibuta
Archive | 2005
Takeyuki Mizutani
Archive | 2006
Tohru Kiuchi; Takeyuki Mizutani; Masahiro Nei; Masato Hamatani; Masahiko Okumura
Archive | 2006
Takeyuki Mizutani; Yuichi Shibazaki; Makoto Shibuta
Archive | 2014
Takeyuki Mizutani
Archive | 2008
Katsushi Nakano; Masahiko Okumura; Tarou Sugihara; Takeyuki Mizutani; Tomoharu Fujiwara
Archive | 2008
Takeyuki Mizutani
Archive | 2005
Katsushi Nakano; Masahiko Okumura; Tarou Sugihara; Takeyuki Mizutani; Tomoharu Fujiwara
Archive | 2007
Takeyuki Mizutani; Yuichi Shibazaki
