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Totzeck Michael

Carl Zeiss AG

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Publication

Featured researches published by Totzeck Michael.

Archive | 2009

Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element

Hauf Markus; Bleidistel Sascha; Migura Sascha; Mann Hans-Juergen; Enkisch Hartmut; Zellner Johannes; Schottner Michael; Kraehmer Daniel; Totzeck Michael; Dodoc Aurelian; Hetzler Jochen; Beierl Helmut; Ulrich Wilhelm

Archive | 2008

Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement

Gruner Toralf; Totzeck Michael

Archive | 2005

Mikroskopisches Abbildungssystem und Verfahren zur Emulation eines hochaperturigen Abbildungssystems, insbesondere zur Maskeninspektion

Harnisch Wolfgang; Schuster Karl-Heinz; Scheruebl Thomas; Greif-Wuestenbecker Joern; Rosenkranz Norbert; Totzeck Michael; Stroessner Ulrich; Feldmann Heiko; Gruner Toralf

Archive | 2009

Optisches System einer mikrolithographischen Projektionsbelichtungsanlage

Mueller Ralf; Gruner Toralf; Totzeck Michael; Feldmann Heiko; Paul Hans-Jochen

Archive | 2006

MICROSCOPE FOCUSING SYSTEM, AND METHOD ESPECIALLY FOR INSPECTING MASK FOR EMULATING HIGH-APERTURE FOCUSING SYSTEM

Harnisch Wolfgang; Scheruebl Thomas; Rosenkranz Norbert; Schuster Karl-Heinz; Greif-Wuestenbecker Joern; Totzeck Michael; Stroessner Ulrich; Gruner Toralf; Feldmann Heiko

Archive | 2013

Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component

Kraehmer Daniel; Kamenov Vladimir; Totzeck Michael; Goehnermeier Aksel

Archive | 2012

Microlithographic illumination method as well as a projection illumination system for carrying out the method

Gruner Toralf; Kraehmer Daniel; Totzeck Michael; Wangler Johannes; Brotsack Markus; Dieckmann Nils; Goehnermeier Aksel; Schwab Markus

Archive | 2005

OPTICAL SYSTEM IN PROJECTION ALIGNER FOR MICROLITHOGRAPHY

Maul Manfred; Totzeck Michael; Dittmann Olaf; Fiolka Damian

Archive | 2004

Objective with doubly refracting lenses especially a projection objective for microphotolithography and compensation process has two different sets of doubly refracting lenses

Totzeck Michael; Kraehmer Daniel; Kamenov Vladimir; Ulrich Wilhelm

Archive | 2015

Optische Anordnung zur Erfassung von spekular reflektiertem Licht

Koos Christian; Widulle Frank; Totzeck Michael; Sandfuchs Oliver

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Gruner Toralf

Carl Zeiss AG

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Kraehmer Daniel

Carl Zeiss AG

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Widulle Frank

Carl Zeiss AG

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Feldmann Heiko

Carl Zeiss AG

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Ersun Kartal

Carl Zeiss AG

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Fiolka Damian

Carl Zeiss AG

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Holger Wegendt

Carl Zeiss AG

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Mann Hans-Juergen

Carl Zeiss AG

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Schuster Karl-Heinz

Carl Zeiss AG

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Schwab Markus

Carl Zeiss AG

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