Uwe Dersch

Impact of EUV mask pattern profile shape on CD measured by CD-SEM

For extreme ultraviolet lithography (EUVL) the absorber binary mask is until now the most promising mask type. Since at EUV only reflective masks are possible, EUVL will introduce new materials for mask manufacturing. In addition it is likely that the pattern of an EUV mask will consist of a structured double layer system. Therefore, mask CD-SEM metrology for EUVL has to deal with the contrast of rather new materials and has to face a more complex mask pattern topography situation. Using a Monte Carlo model, we simulate the SEM-signals emerging from a given EUV mask pattern topography while scanned by the electron beam of a SEM. The simulation is tuned to closely match the experimental situation of a commercial CD-SEM. Generated SEM images are analyzed by means of a commercial CD-algorithm and a peak detection CD-algorithm. Knowing the exact pattern shape that are fed into the simulation, we determine the effect of specific pattern profile changes on SEM-signal and algorithm specific CD.

EUV mask image placement management in writing, registration, and exposure tools

Due to the non-telecentricity of the EUV illumination, the EUV mask flatness budget dictates the use of an electrostatic chuck in the exposure tool. Since the mask backside flattening provided by the electrostatic chuck in the exposure tool is very different from the 3-point mounts currently employed to hold reticles in pattern generation and registration measurement tools, this raises the question of which mounting techniques to apply in future patterning and registration tools. In case drastic changes need to be made to the tool configurations, it is important to know, and as early as possible, whether backside chucking of reticles, via an electrostatic or vacuum chuck, is absolutely required or if a 3-point mounting scheme can suffice in these tools. Using finite element simulations, the effects on EUV mask image placement of stressed layers and their patterning, as well as substrate and chuck non-flatness were predicted for these different conditions. The results can be used to calculate image placement error budgets and determine what substrate and blank specifications are needed for the implementation of EUV at the 32-nm node.

Numerical and experimental study of oxide growth on EUV mask capping layers

The interface roughness of EUV mask multilayers was taken into account for the numerical calculation of blank reflectance, and models for the growth of oxide on Si capping layers were proposed and evaluated. The simulations were then checked and validated with reflectometry measurements at different steps of the mask blank processing as well as for various angles of incidence, and ellipsometry data on layer thickness. The benchmarked models made it possible to characterize EUV mask blank Mo/Si multilayers (period, thickness ratio, number of bilayers), as well as Si capping layers and native oxide layers from reflectivity measurements. This enabled the study, via a combination of experiments and simulations, of the growth of SiO2 layers, bringing deeper understanding into this phenomenon. Finally, the simulations were used to more properly optimize multilayers and quantify the influence of the exposure tool illumination numerical aperture. Having successfully matched reflectivity data around the actinic wavelength, it was also possible to extend the models to inspection wavelengths in order to predict inspection contrast values.

Manufacturing of the first EUV full-field scanner mask

In the framework of the European EXTUMASK project, the Advanced Mask Technology Center in Dresden (AMTC) has established in close collaboration with the Institute of Microelectronics in Stuttgart (IMS-Chips) an integrated mask process suited to manufacture EUV masks for the first full field EUV scanner, the ASML α-demo tool. The first product resulting from this process is the ASML set-up mask, an EUV mask designed to realize the tool set-up. The integrated process was developed based on dummy EUV blank material received from Schott Lithotec in Meiningen (Germany). These blanks have a TaN-based absorber layer and a SiO2 buffer layer. During process development the e-beam lithographic behaviour as well as the patterning performance of the material were studied and tuned to meet first EUV mask specifications. For production of the ASML set-up mask the new process was applied to a high performance EUV blank from Schott Lithotec. This blank has absorber and buffer layers identical to the dummy blanks but a multilayer is embedded which is deposited on an LTEM substrate. The actinic behaviour of the multilayer and the flatness of the substrate were tuned to match the required mask specifications. In this article we report on the development of the mask manufacturing process and show performance data of produced EUV full field scanner masks. Thereby, special attention is given to the ASML set-up mask.

EUVL mask manufacturing: technologies and results

Extreme Ultraviolet Lithography (EUVL) is the favourite next generation lithography candidate for IC device manufacturing with feature sizes beyond 32nm. Different stacks and manufacturing concepts have been published for the fabrication of the reflective EUVL masks. Patterning processes for two different absorber-buffer combinations on top of the reflective multi layer mirror have been developed. A TaN/SiO2 absorber-buffer stack was provided by supplier A and TaBN/Cr by supplier B. In addition both absorbers were covered by an anti reflective coating (ARC) layer. An e-beam patterned 300nm thick film of Fuji FEP171 was used as resist mask. We optimized the etching processes for maximum selectivities between absorber, buffer and capping layers on the one hand and rectangular profiles and low etch bias on the other hand. While both TaN based absorbers have been dry etched in an UNAXIS mask etcher III, wet and dry etch steps have been evaluated for the two different buffer layers. The minimum feature size of lines and holes in our test designs was 100nm. After freezing the processes a proximity correction was determined considering both, the influence of electron scattering due to e-beam exposure and the influence of the patterning steps. Due to the correction an outstanding linearity and iso/dense bias on different test designs was achieved. Various masks for printing experiments at the small-field Micro Exposure Tool (MET) in Berkeley and the fabrication of the ASML α-tool setup mask within the European MEDEA+ EXTUMASK project were done using the developed processes. Finally, we will compare and discuss the results of the two stack approaches.

Comparison of EUV mask architectures by process window analysis

Several masks have been fabricated and exposed with the small-field Micro Exposure Tool (MET) at the Advanced Light Source (ALS) synchrotron in Berkeley using EUV radiation at 13.5 nm wavelength. Investigated mask types include two different absorber masks with TaN absorber as well as an etched multilayer mask. The resulting printing performance under different illumination conditions were studied by process window analysis on wafer level. Features with resolution of 60 nm and below were resolved with all masks. The TaN absorber masks with different stack thicknesses showed a similar size of process window. The differences in process windows for line patterns were analyzed for 60 nm patterns. The implications on the choice of optimum mask architecture are discussed.

The first full-field EUV masks ready for printing

ASMLs first EUV alpha demo tool (ADT) is ready for lithographic set up, driving the need for qualified and fully compliant EUV masks. EUV reflection masks are different in blank and mask processes compared to current technologies e.g. masks for 193nm. Although in recent years individual EUV mask parameters have been demonstrated, it is only with the fabrication on the ADT mask set that fully compliant masks have been made. In this paper we discuss the typical requirements of a EUV full-field mask, and show first results from achieving the important milestone of fabricating EUV masks.

Comparative study of mask architectures for EUV lithography

Three different architectures were compared as candidates for EUV lithography masks. Binary masks were fabricated using two different stacks of absorber materials and using a selective etching process to directly pattern the multilayer of the mask blank. To compare the effects of mask architecture on resist patterning, all three masks were used to print features into photoresist on the EUV micro-exposure tool (MET) at Lawrence Berkeley National Laboratory. Process windows, depth of focus, mask contrast at EUV, and horizontal and vertical line width bias were use as metrics to compare mask architecture. From printing experiments, a mask architecture using a tantalum nitride absorber stack exhibited the greatest depth of focus and process window of the three masks. Experimental results obtained using prototype masks are discussed in relation to simulations. After accounting for CD biasing on the masks, similar performance was found for all three mask architectures.