Wei-E Wang

RECTANGULAR NANOSHEET FABRICATION

METHODS OF FORMING DEFECT-FREE SRB ONTO LATTICE-MISMATCHED SUBSTRATES AND DEFECT-FREE FINS ON INSULATORS

METHODS OF FORMING LOW-DEFECT STRAIN-RELAXED LAYERS ON LATTICE-MISMATCHED SUBSTRATES AND RELATED SEMICONDUCTOR STRUCTURES AND DEVICES

SEMICONDUCTOR DEVICE INCLUDING A REPEATER/BUFFER AT HIGHER METAL ROUTING LAYERS AND METHODS OF MANUFACTURING THE SAME

Methods of forming semiconductor patterns including reduced dislocation defects and devices formed using such methods

Relaxed Semiconductor Layers With Reduced Defects and Methods of Forming the Same

Methods of Forming Nanosheets on Lattice Mismatched Substrates

MULTI-VT GATE STACK FOR III-V NANOSHEET DEVICES WITH REDUCED PARASITIC CAPACITANCE

NANOSHEET AND NANOWIRE DEVICES HAVING SOURCE/DRAIN STRESSORS AND METHODS OF MANUFACTURING THE SAME

Multi-layer fin field effect transistor devices and methods of forming the same