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Zheng John Ye

Applied Materials

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Publication

Featured researches published by Zheng John Ye.

Archive | 2014

HIGH IMPEDANCE RF FILTER FOR HEATER WITH IMPEDANCE TUNING DEVICE

Jian J. Chen; Mohamad A. Ayoub; Juan Carlos Rocha-Alvarez; Zheng John Ye; Ramprakash Sankarakrishnan; Jianhua Zhou

Archive | 2014

PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IMPROVED UNIFORMITY

Zheng John Ye; Ganesh Balasubramanian; Thuy Bricher; D. Pinson Ii Jay; Hiroji Hanawa; Juan Carlos Rocha-Alvarez; Kwangduk Douglas Lee; Martin Jay Seamons; Bok Hoen Kim; Sungwon Ha

Archive | 2015

Methods of directing magnetic fields in a plasma source, and associated systems

Zheng John Ye; D. Pinson Ii Jay; Hiroji Hanawa; Juan Carlos Rocha-Alvarez

Archive | 2017

SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES

Xing Lin; Jianhua Zhou; Edward P. Hammond; Zheng John Ye; Zonghui Su; Jaeyong Cho; Juan Carlos Rocha-Alvarez

Archive | 2017

METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS

Zheng John Ye; Abdul Aziz Khaja; Amit Kumar Bansal; Kwangduk Douglas Lee; Xing Lin; Jianhua Zhou; Addepalli Sai Susmita; Juan Carlos Rocha-Alvarez

Archive | 2017

SOCLE DE SUPPORT DE SUBSTRAT À ÉLÉMENTS DE CONFINEMENT DE PLASMA

Xing Lin; Jianhua Zhou; Edward P. Hammond; Zheng John Ye; Zonghui Su; Jaeyong Cho; Juan Carlos Rocha-Alvarez

Archive | 2017

A quiet electrical card dish for supporting substrate

Juan Carlos Rocha-Alvarez; Xing Lin; Jianhua Zhou; Jian J. Chen; Zheng John Ye

Archive | 2016

GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCKING AND EXCELLENT PARTICLE PERFORMANCE FOR BORON-DOPED CARBON FILMS

Prashant Kumar Kulshreshtha; Ziqing Duan; Abdul Aziz Khaja; Zheng John Ye; Amit Kumar Bansal

Archive | 2015

Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system

Zheng John Ye; Jay D. Pinson; Hiroji Hanawa; Jianhua Zhou; Xing Lin; Ren-Guan Duan; Kwangduk Douglas Lee; Bok Hoen Kim; Swayambhu P. Behera; Sungwon Ha; Ganesh Balasubramanian; Juan Carlos Rocha-Alvarez; Prashant Kumar Kulshreshtha; Jason K. Foster; Mukund Srinivasan; Uwe P. Haller; Hari Ponnekanti

Archive | 2015

EDGE HUMP REDUCTION FACEPLATE BY PLASMA MODULATION

Sungwon Ha; Kwangduk Douglas Lee; Ganesh Balasubramanian; Juan Carlos Rocha-Alvarez; Martin Jay Seamons; Ziqing Duan; Zheng John Ye; Bok Hoen Kim; Lei Jing; Ngoc Le; Ndanka O. Mukuti

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Juan Carlos Rocha-Alvarez

Applied Materials

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Jianhua Zhou

Applied Materials

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Kwangduk Douglas Lee

Applied Materials

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Xing Lin

Applied Materials

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Bok Hoen Kim

Applied Materials

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Ganesh Balasubramanian

Applied Materials

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Hiroji Hanawa

Applied Materials

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Jian J. Chen

Applied Materials

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Prashant Kumar Kulshreshtha

Applied Materials

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Sungwon Ha

Applied Materials

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