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Kwangduk Douglas Lee

Applied Materials

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Publication

Featured researches published by Kwangduk Douglas Lee.

Archive | 2006

Enhancement of remote plasma source clean for dielectric films

Thomas Nowak; Kang Sub Yim; Sum-Yee Betty Tang; Kwangduk Douglas Lee; Vu Ngoc Tran Nguyen; Dennis Singleton; Martin Jay Seamons; Karthik Janakiraman; Ganesh Balasubramanian; Mohamed Ayoub; Wendy H. Yeh; Alexandros T. Demos; Hichem M'Saad

Archive | 2009

Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (pecvd)

Kwangduk Douglas Lee; Takashi Morii; Yoichi Suzuki; Sudha Rathi; Martin Jay Seamons; Deenesh Padhi; Bok Hoen Kim; Cynthia Pagdanganan

Archive | 2011

Ultra high selectivity ashable hard mask film

Kwangduk Douglas Lee; Martin Jay Seamons; Sudha Rathi; Chiu Chan; Michael H. Lin

Archive | 2006

Methods for low temperature deposition of an amorphous carbon layer

Sum-Yee Tang; Hsin Chiao Luan; Kwangduk Douglas Lee; Bok Hoen Kim

Archive | 2010

Graded arc for high na and immersion lithography

Wendy H. Yeh; Martin Jay Seamons; Matthew Spuller; Sum-Yee Betty Tang; Kwangduk Douglas Lee; Sudha Rathi

Archive | 2011

Ultra high selectivity doped amorphous carbon strippable hardmask development and integration

Martin Jay Seamons; Sudha Rathi; Kwangduk Douglas Lee; Deenesh Padhi; Bok Hoen Kim; Chiu Chan

Archive | 2007

Methods for high temperature deposition of an amorphous carbon layer

Martin Jay Seamons; Yoganand N. Saripalli; Kwangduk Douglas Lee; Bok Hoen Kim; Visweswaren Sivaramakrishnan; Wendy H. Yeh; Josephine Ju-Hwei Chang Liu; Amir Al-Bayati; Hichem M'Saad

Archive | 2011

METHODS OF REMOVING A MATERIAL LAYER FROM A SUBSTRATE USING WATER VAPOR TREATMENT

Kwangduk Douglas Lee; Sudha Rathi; Chiu Chan; Martin Jay Seamons; Bok Heon Kim

Archive | 2010

PLANARIZING ETCH HARDMASK TO INCREASE PATTERN DENSITY AND ASPECT RATIO

Martin Jay Seamons; Kwangduk Douglas Lee; Chiu Chan; Patrick Reilly; Sudha Rathi

Archive | 2007

Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes

Kwangduk Douglas Lee; Matthew Spuller; Martin Jay Seamons; Wendy H. Yeh; Bok Hoen Kim; Mohamad A. Ayoub; Amir Al-Bayati; Hichem M'Saad

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Collaboration

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Martin Jay Seamons

Applied Materials

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Bok Hoen Kim

Applied Materials

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Sudha Rathi

Applied Materials

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Ganesh Balasubramanian

Applied Materials

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Prashant Kumar Kulshreshtha

Applied Materials

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Wendy H. Yeh

Applied Materials

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Chiu Chan

Applied Materials

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Juan Carlos Rocha-Alvarez

Applied Materials

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Zheng John Ye

Applied Materials

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Hichem M'Saad

Applied Materials

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