Zhongze Wang

Anti-fuse device

GROUNDING DUMMY GATE IN SCALED LAYOUT DESIGN

Reverse self aligned double patterning process for back end of line fabrication of a semiconductor device

Merging lithography processes for gate patterning

Integrated circuit device featuring an antifuse and method of making same

Method of forming fins from different materials on a substrate

Static random access memory (SRAM) bit cells with wordline landing pads split across boundary edges of the SRAM bit cells

STATIC RANDOM ACCESS MEMORY (SRAM) BIT CELLS WITH WORDLINES ON SEPARATE METAL LAYERS FOR INCREASED PERFORMANCE, AND RELATED METHODS

Differential one-time-programmable (OTP) memory array

COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO ACHIEVE SUB-THRESHOLD PATTERN FEATURES