Kiran V. Thadani
Applied Materials
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Publication
Featured researches published by Kiran V. Thadani.
international memory workshop | 2010
Udayan Ganguly; Yoshitaka Yokota; Jing Tang; Shiyu Sun; Matthew S. Rogers; Miao Jin; Kiran V. Thadani; Hiroshi Hamana; Garlen C. Leung; Balaji Chandrasekaran; Sunderraj Thirupapuliyur; C. Olsen; Vicky Nguyen; Swami Srinivasan
Floating Gate (FG) NAND scaling has been severely challenged by the reduction of gate coupling ratio (CR) and increase in FG interference (FGI) below 30nm node. Firstly, scalability of inverted ‘T’ shaped FG is evaluated by 3D electrostatics simulation. It is shown that coupling ratio (CR) and Floating Gate Interference (FGI) performance can be maintained at the level of 34nm technology down to 13nm node by engineering key aspects of the FG shape namely FG top width (FGW) and effective field height (EFH) in addition to conventional scaling approaches of IPD thinning and spacer к reduction. Secondly, FG shaping is demonstrated down to FGW of 3nm and EFH of 5nm using a sacrificial oxidation technology with no birds beak to demonstrate fabrication feasibility.
Archive | 2010
Kiran V. Thadani; Jing Tang; Nitin K. Ingle; Dongqing Yang
Archive | 2012
Amit Chatterjee; Abhijit Basu Mallick; Nitin K. Ingle; Brian Saxton Underwood; Kiran V. Thadani; Xiaolin Chen; Abhishek Dube; Jingmei Liang
Archive | 2013
Kiran V. Thadani; Jingjing Xu; Abhijit Basu Mallick; Joe Griffith Cruz; Nitin K. Ingle; Pravin K. Narwankar
Archive | 2014
Kiran V. Thadani; Abhijit Basu Mallick; Nitin K. Ingle
Archive | 2015
Pramit Manna; Kiran V. Thadani; Abhijit Basu Mallick
Archive | 2014
Pramit Manna; Kiran V. Thadani; Abhijit Basu Mallick
Archive | 2013
Sum-Yee Betty Tang; Martin Jay Seamons; Kiran V. Thadani; Abhijit Basu Mallick
Archive | 2015
Kiran V. Thadani; Adhijit Basu Mallick; Sanjay Kamath
Archive | 2015
Jingmei Liang; Kiran V. Thadani; Jessica Kachian; Nagarajan Rajagopalan
