Akimitsu Ebihara

Precision motion stage with single guide beam and follower stage

Electromagnetic alignment and scanning apparatus

Projection optical device and exposure apparatus

Exposure apparatus, and device manufacturing method

Wafer positioner with planar motor and mag-lev fine stage

Precision scanning apparatus and method with fixed and movable guide members

Tilt and movement apparatus using flexure and air cylinder

Stage apparatus, coordinate correction method for the stage apparatus, exposure apparatus, and device production method

Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers

Scanning exposure methods