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Dive into the research topics where Alexander N. Lerner is active.

Publication


Featured researches published by Alexander N. Lerner.


Archive | 2003

Multi-chemistry plating system

Michael X. Yang; Ming Xi; Russell C. Ellwanger; Eric B. Britcher; Bernardo Donoso; Lily L. Pang; Svetlana Sherman; Henry Ho; Anh N. Nguyen; Alexander N. Lerner; Allen L. D'Ambra; Arulkumar Shanmugasundram; Tetsuya Ishikawa; Yevgeniy Rabinovich; Dmitry Lubomirsky; Yeuk-Fai Edwin Mok; Son T. Nguyen


Archive | 2008

Temperature measurement and control of wafer support in thermal processing chamber

Khurshed Sorabji; Alexander N. Lerner; Joseph M. Ranish; Aaron Muir Hunter; Bruce E. Adams; Mehran Behdjat; Rajesh S. Ramanujam


Archive | 2008

Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber

Blake Koelmel; Alexander N. Lerner; Joseph M. Ranish; Kedarnath Sangam; Khurshed Sorabji


Archive | 2011

Transparent reflector plate for rapid thermal processing chamber

Blake Koelmel; Aaron Muir Hunter; Alexander N. Lerner


Archive | 2007

Rapid conductive cooling using a secondary process plane

Khurshed Sorabji; Alexander N. Lerner


Archive | 2005

Single wafer dryer and drying methods

Younes Achkire; Alexander N. Lerner; Boris Govzman; Boris Fishkin; Michael Sugarman; Rashid Mavliev; Haoquan Fang; Shijian Li; Guy Shirazi; Jianshe Tang


Archive | 2002

Rotary vacuum-chuck with venturi formed at base of rotating shaft

Donald J. K. Olgado; Bernardo Donoso; Alexander N. Lerner


Archive | 2003

Substrate centering apparatus and method

Alexander N. Lerner; Avi Tepman; Donald Olgato


Archive | 2001

Planarization of metal layers on a semiconductor wafer through non-contact de-plating and control with endpoint detection

Donald J. K. Olgado; Joseph J. Stevens; Alexander N. Lerner


Archive | 2000

Method for managing a fluid level associated with a substrate processing tank

Alexander N. Lerner; Brian J. Brown; Boris Fishkin; Jonathan Frankel

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