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Stefan-Wolfgang Schmidt

Carl Zeiss AG

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Publication

Featured researches published by Stefan-Wolfgang Schmidt.

Archive | 2011

EUV Lithography Device and Method For Processing An Optical Element

Wolfgang Singer; Yim-Bun-Patrick Kwan; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung

Archive | 2009

METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING THE RESIDUAL GAS ATMOSPHERE AND THE CONTAMINATION AND EUV LITHOGRAPHY DEVICE

Dieter Kraus; Dirk Heinrich Ehm; Thomas Stein; Harald Woelfle; Stefan-Wolfgang Schmidt

Archive | 2008

EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINATION STATUS OF AN EUV-REFLECTIVE OPTICAL SURFACE

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt

Archive | 2011

DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt

Archive | 2010

Cleaning module, EUV lithography device and method for the cleaning thereof

Stefan Hembacher; Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Koehler; Almut Czap; Stefan Wiesner; Hin Yiu Anthony Chung

Archive | 2010

Optical arrangement in a projection exposure apparatus for euv lithography

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Guenther Dengel

Archive | 2013

Method for production of micro-or nano-structured components such as optical element, involves irradiating photons and/or electrons according to the structure to be produced, so that full surface material compaction takes place

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt

Archive | 2012

OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Guenther Dengel

Archive | 2011

Method for avoiding contamination and euv-lithography-system

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Wiesner; Almut Czap; Stefan Koehler; Hin Yiu Anthony Chung

Archive | 2011

Anordnung zur Verwendung in einer Projektionsbelichtungsanlage für die Mikrolithographie mit einem reflektiven optischen Element

Heinrich Dr. Ehm; Maarten van Kampen; Stefan-Wolfgang Schmidt

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Collaboration

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Dirk Heinrich Ehm

Carl Zeiss AG

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Dieter Kraus

Carl Zeiss AG

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Moritz Becker

Carl Zeiss AG

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Almut Czap

Carl Zeiss AG

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Hin Yiu Anthony Chung

Carl Zeiss AG

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Stefan Wiesner

Carl Zeiss AG

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Edwin te Sligte

Carl Zeiss AG

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Stefan Koehler

Carl Zeiss AG

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Heinrich Dr. Ehm

Carl Zeiss AG

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Arnoldus Jan Storm

Carl Zeiss AG

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