Bo-Young Seo
Samsung
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Publication
Featured researches published by Bo-Young Seo.
international memory workshop | 2014
Yong Kyu Lee; Bo-Young Seo; Tea-kwang Yu; Bongsang Lee; Euiyeol Kim; Chang-Min Jeon; Weon-Ho Park; Yongtae Kim; Duck-Hyung Lee; Hyo-sang Lee; Sunghee Cho
For the first time, 4Mb split-gate type embedded flash is developed in 45-nm technology with 1M cycling endurance for mass production of various applications. Process integration is designed for logic compatibility, minimizing shift of logic device characteristics so that existing IPs can be used. By process optimization of triple-gate flash architecture, high speed operation (write time of 25us and erase operation of less than 2ms) and robust reliability (1M cycle, 150 □ retention) are achieved.
symposium on vlsi technology | 2017
Yong Kyu Lee; Chang-Min Jeon; Hong-Kook Min; Bo-Young Seo; Kwang-tae Kim; Dong-Hyun Kim; Kyung-Soo Min; JongSung Woo; Hyunug Kang; Yong-Seok Chung; Min-Su Kim; Jaejune Jang; KyongSik Yeom; Ji-Sung Kim; MyeongHee Oh; Hyo-sang Lee; Sunghee Cho; Duck-Hyung Lee
We developed a 4Mb split-gate e-flash on 28-nm low-power HKMG logic process, which demonstrates the smallest bit-cell size (0.03×-um2) for high performance IoT applications. High speed operation (25us write time and 2ms erase operation) and robust reliability (500K cycle, 10 years retention) are achieved through optimization of triple-gate flash architecture and scaling of word-line (WL) transistor. New type of high-voltage transistor with LDD-first scheme is applied to enable further scaling of decoder block in Flash IP. Digital-Vdd (1.0V) read operation is used by lowering threshold voltage (Vth) of HV transistor without sacrificing break-down during Flash P/E operation. By using module process concept, the existing RF and logic IP is reused without modification.
international memory workshop | 2016
Yong-kyu Lee; Hong-Kook Min; Chang-Min Jeon; Bo-Young Seo; Ga-Young Lee; Eunkang Park; Dong Hyun Kim; Changhyun Park; Baeseong Kwon; Minsu Kim; Bongsang Lee; Duck-Hyung Lee; Hyo-sang Lee; Jisung Kim; Sung-Hee Cho
We present a highly scalable 2nd generation 45-nm split-gate embedded flash, which has been scaled of 40% unit-cell-size (almost same size with 28-nm technology node) from the 1st generation 45-nm embedded flash without using extra masks, processes and advanced-equipment. By optimizing process of triple-gate flash architecture and implementing several design methodologies, high speed operation (10ns random access time, 25us write time and less than 2ms erase operation) and robust reliability (1M cycle, 20 retention) are achieved. It has been successfully verified in range of 1Mb up to 16Mb density flash IPs.
Archive | 2005
Ji-Hoon Park; Seung-Beom Yoon; Jeong-Uk Han; Seong-Gyun Kim; Sung-taeg Kang; Bo-Young Seo; Sang-Woo Kang; Sung-Woo Park
Archive | 2008
Sung-taeg Kang; Hee-Seog Jeon; Jeong-Uk Han; Chang-hun Lee; Bo-Young Seo; Chang-Min Jeon; Eun-Mi Hong
Archive | 2010
Bo-Young Seo; Hee-Seog Jeon; Kwang-tae Kim; Ji-Hoon Park; Myung-Jo Chun
Archive | 2013
Tea-kwang Yu; Kwang-tae Kim; Yong-Tae Kim; Bo-Young Seo; Yong-kyu Lee; Hee-Seog Jeon
Archive | 2012
Bo-Young Seo; Yong-kyu Lee; Hyucksoo Yang; Yong-Tae Kim; Byungsup Shim
Archive | 2014
Chang-Min Jeon; Bo-Young Seo; Tea-kwang Yu
Archive | 2008
Bo-Young Seo; Hee-Seog Jeon; Sung-taeg Kang