Christopher H. Raeder

System and method for controlling a multi-arm polishing tool

Method for filling trenches

Method and apparatus for controlling within-wafer uniformity in chemical mechanical polishing

Polishing pad having a wear level indicator and system using the same

Polishing pad having open area which varies with distance from initial pad surface

System and method for independent air bearing zoning for semiconductor polishing device

Infrared inspection for determining residual films on semiconductor devices

Apparatus for filling trenches

Method and product for improved use of low k dielectric material among integrated circuit interconnect structures

Method for determining the efficiency of a planarization process