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Clifford C. Stow

Applied Materials

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Publication

Featured researches published by Clifford C. Stow.

Archive | 2002

Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers

Jennifer Y. Sun; Shun Jackson Wu; Senh Thach; Ananda H. Kumar; Robert W. Wu; Hong Wang; Yixing Lin; Clifford C. Stow

Archive | 2003

Method of cleaning a coated process chamber component

Hong Wang; Yongxiang He; Clifford C. Stow

Archive | 2001

Electrochemically roughened aluminum semiconductor processing apparatus surfaces

Jennifer Y. Sun; Clifford C. Stow; Senh Thach

Archive | 2003

CLEAN ALUMINUM ALLOY FOR SEMICONDUCTOR PROCESSING EQUIPMENT

Shun Wu; Clifford C. Stow; Hong Wang; Yixing Lin

Archive | 2008

Method of coating semiconductor processing apparatus with protective yttrium-containing coatings

Jennifer Y. Sun; Shun Jackson Wu; Senh Thach; Ananda H. Kumar; Robert W. Wu; Hong Wang; Yixing Lin; Clifford C. Stow; Jim Dempster; Li Xu; Kenneth S. Collins; Ren-Guan Duan; Thomas Graves; Xiaoming He; Jie Yuan

Archive | 2004

Process chamber component with layered coating and method

Yixing Lin; Daijiang Xu; Clifford C. Stow

Archive | 2001

Methods of roughening a ceramic surface

Edwin C. Weldon; Yongxiang He; Hong Wang; Clifford C. Stow

Archive | 2001

Method of fabricating a coated process chamber component

Yongxiang He; Hong Wang; Clifford C. Stow

Archive | 2002

Laser drilled surfaces for substrate processing chambers

Hong Wang; Yongxiang He; Yixing Lin; Edwin C. Weldon; Clifford C. Stow

Archive | 2003

Cleaning and refurbishing chamber components having metal coatings

Yixing Lin; Dajiang Xu; Clifford C. Stow

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Collaboration

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Hong Wang

Applied Materials

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Yixing Lin

Applied Materials

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Yongxiang He

Applied Materials

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Jennifer Y. Sun

Applied Materials

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Senh Thach

Applied Materials

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Shun Jackson Wu

Applied Materials

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Edwin C. Weldon

Applied Materials

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Ananda H. Kumar

Applied Materials

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Andreas Neuber

Applied Materials

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Daijiang Xu

Applied Materials

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