Clint Montgomery
Texas Instruments
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Publication
Featured researches published by Clint Montgomery.
international workshop on junction technology | 2006
J.P. Lu; D.S. Miles; J. DeLoach; D.F. Yue; P.J. Chen; T. Bonifield; S. Crank; S.F. Yu; F. Mehrad; Y. Obeng; D.A. Ramappa; D. Corum; R.L. Guldi; Lance S. Robertson; X. Liu; L.H. Hall; Yuqing Xu; B.Y. Lin; A.F.Jr. Griffin; F.S. Johnson; T. Grider; D. Mercer; Clint Montgomery
As CMOS technologies move into the 90 nm node and beyond, nickel (Ni) self-aligned suicide (SALICIDE) is transitioning from R&D into mainstream SC fabrication. In this paper, advantages and challenges of Ni SALICIDE process technology will be reviewed. The extension of Ni SALICIDE technology to fully silicided metal gates (FUSI) will be discussed
Archive | 2004
Haowen Bu; Jiong-Ping Lu; Shaofeng Yu; Ping Jiang; Clint Montgomery
Archive | 2005
Jiong-Ping Lu; Clint Montgomery; Lindsey H. Hall; Donald S. Miles; Duofeng Yue; Thomas D. Bonifiield
Archive | 2008
Clint Montgomery; Brian K. Kirkpatrick; Weize Xiong; Steven L. Prins
Archive | 2003
Jiong-Ping Lu; Haowen Bu; Clint Montgomery
Archive | 2005
Brian K. Kirkpatrick; Clint Montgomery; Brian M. Trentman; Randall W. Pak
Archive | 2004
Jiong-Ping Lu; Freidoon Mehrad; Lindsey H. Hall; Vivian Liu; Clint Montgomery; Scott F. Johnson
Archive | 2007
Aaron Frank; David Gonzalez; Mark R. Visokay; Clint Montgomery
Archive | 2005
Alfred J. Griffin; Adel El Sayed; John Paul Campbell; Clint Montgomery
Archive | 2009
Jiong-Ping Lu; Haowen Bu; Clint Montgomery
