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Dive into the research topics where Darryl Angelo is active.

Publication


Featured researches published by Darryl Angelo.


Archive | 1999

Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance

Darryl Angelo; Arvind Sundarrajan; Peijun Ding; James H. Tsung; Ilyoung Richard Hong; Barry Chin


Archive | 2003

Method and apparatus for sputter deposition

Suraj Rengarajan; Michael Miller; Darryl Angelo; Nirmalya Maity; Peijun Ding


Archive | 2002

Pressure modulation method to obtain improved step coverage of seed layer

Arvind Sundarrajan; Darryl Angelo; Peiijun Ding; Barry Chin; Imran Hasim


Archive | 2005

Contaminant reducing support system

Vijay D. Parkhe; Matthew Leopold; Timothy Ronan; Todd W. Martin; Edward Ng; Nitin Khurana; Song-Moon Suh; Richard Fay; Christopher Hagerty; Michael R. Rice; Darryl Angelo; Kurt J. Ahman; Matthew C. Tsai; Steve Sansoni


Archive | 2000

Temperature control of a substrate

Arvind Sundarrajan; Darryl Angelo; Tse-Yong Yao; Peijun Ding


Archive | 2007

Substrate support components having quartz contact tips

Timothy Ronan; Yuanhong Guo; Robert Irwin Decottignies; Todd W. Martin; Darryl Angelo; Song-Moon Suh; Nitin Khurana; Edward Ng


Archive | 2000

Ionized metal plasma copper vapor deposition improved in capacity of grain in thin film

Darryl Angelo; Barry Chin; Peijun Ding; Richard Hong; Arvind Sundarrajan; James H. Tsung; スンダラヤン アルヴィンド; リチャード ホン イリョウン; エイチ ツン ジェームズ; アンジェロ ダーリル; チン バリー; ディン ペイユン


Archive | 2005

Systeme de transport et de support de substrats a reduction de contaminants

Vijay D. Parkhe; Matthew Leopold; Timothy Ronan; Todd W. Martin; Edward Ng; Nitin Khurana; Song-Moon Suh; Richard Fay; Christopher Hagerty; Michael R. Rice; Darryl Angelo; Kurt J. Ahman; Matthew C. Tsai; Steve Sansoni


Archive | 2000

Method of depositing materials on substrates

Darryl Angelo; Barry Chin; Peijun Ding; Imran Hashim; Arvind Sundarrajan


Archive | 2000

Verfahren und Gerät zur ionisierter Metallplasma-Kupferbeschichtung mit erhöhter Leistung der filminneren Partikeln

Darryl Angelo; Barry Chin; Peiun Ding; Richard Hong; Arvind Sundarrajan; James H. Tsung

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