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David J. Kubista

Micron Technology

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Publication

Featured researches published by David J. Kubista.

Archive | 2002

Apparatus and process of improving atomic layer deposition chamber performance

Philip H. Campbell; David J. Kubista

Archive | 2003

Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

Lingyi A. Zheng; Trung T. Doan; Lyle D. Breiner; Er-Xuan Ping; Kevin L. Beaman; Ronald A. Weimer; David J. Kubista; Cem Basceri

Archive | 2003

Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces

Cem Basceri; Trung T. Doan; Ronald A. Weimer; Kevin L. Beaman; Lyle D. Breiner; Lingyi A. Zheng; Er-Xuan Ping; Demetrius Sarigiannis; David J. Kubista

Archive | 2003

Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers

Kevin L. Beaman; Ronald A. Weimer; Lyle D. Breiner; Er-Xuan Ping; Trung T. Doan; Cem Basceri; David J. Kubista; Lingyi A. Zheng

Archive | 2003

Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers

David J. Kubista; Trung T. Doan; Lyle D. Breiner; Ronald A. Weimer; Kevin L. Beaman; Er-Xuan Ping; Lingyi A. Zheng; Cem Basceri

Archive | 1993

Sputtering with collinator cleaning within the sputtering chamber

Gurtej S. Sandhu; Sung C. Kim; David J. Kubista

Archive | 2000

Method of selective oxidation in semiconductor manufacture

Don Carl Powell; Ron Weimer; Lyle D. Breiner; Howard E. Rhodes; Jeff McKee; David J. Kubista

Archive | 2011

Methods for forming small-scale capacitor structures

Lingyi A. Zheng; Trung T. Doan; Lyle D. Breiner; Er-Xuan Ping; Kevin L. Beaman; Ronald A. Weimer; Cem Basceri; David J. Kubista

Archive | 2010

Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition

Kevin L. Beaman; Trung T. Doan; Lyle D. Breiner; Ronald A. Weimer; Er-Xuan Ping; David J. Kubista; Cem Basceri; Lingyi A. Zheng

Archive | 2002

Atomic layer deposition apparatus and process

Philip H. Campbell; David J. Kubista

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Collaboration

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Lyle D. Breiner

Micron Technology

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Cem Basceri

Micron Technology

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Er-Xuan Ping

Micron Technology

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Kevin L. Beaman

Micron Technology

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Lingyi A. Zheng

Micron Technology

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Ronald A. Weimer

Micron Technology

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Trung T. Doan

Micron Technology

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Philip H. Campbell

Micron Technology

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Demetrius Sarigiannis

Micron Technology

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Don Carl Powell

Micron Technology

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