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Heiko Siekmann

Carl Zeiss AG

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Publication

Featured researches published by Heiko Siekmann.

Archive | 2008

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

Oliver Wolf; Heiko Siekmann; Eva Kalchbrenner; Siegfried Rennon; Johannes Wangler; Andre Bresan; Michael Gerhard; Nils Haverkamp; Axel Scholz; Ralf Scharnweber; Michael Layh; Stefan Burkart

Archive | 2013

Method for producing a reflective optical component for an euv projection exposure apparatus and component of this type

Holger Kierey; Heiko Siekmann; Andre Bresan

Archive | 2012

Substrat für Spiegel für die EUV-Lithographie

Claudia Ekstein; Johannes Lippert; Holger Maltor; Martin Weiser; Heiko Siekmann; Udo Dinger

Archive | 2006

Micro interferometer for micro roughness measurements on lithographic system optics has reference mirror generally curved to match object under test

Frank Eisert; Heiko Siekmann; Hubert Hofer; Martin Weis

Archive | 2013

Substrate for mirrors for EUV lithography

Claudia Ekstein; Johannes Lippert; Holger Maltor; Martin Weiser; Heiko Siekmann; Udo Dinger

Archive | 2014

Method for manufacturing facet mirror for projection exposure system, involves arranging facet mirror elements on facet mirror base by robot, where each facet mirror element is provided with unique identification code

Jürgen Baier; Wolfgang Hammele; Heiko Siekmann

Archive | 2012

Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement

Holger Kierey; Heiko Siekmann; Andre Bresan

Archive | 2017

Vorrichtung zur Formung von Laserstrahlung sowie Beleuchtungssytem

Axel Scholz; Horst Maurer; Vladimir Davydenko; Ralf Stützle; Frank Schlesener; Andre Bresan; Heiko Siekmann

Archive | 2015

Device for shaping laser radiation as well as illumination system

Axel Scholz; Horst Maurer; Vladimir Davydenko; Ralf Stützle; Frank Schlesener; Andre Bresan; Heiko Siekmann

Archive | 2012

Procédé pour produire un composant optique réfléchissant pour un appareil d'exposition à projection de l'extrême ultraviolet et composant de ce type

Holger Kierey; Heiko Siekmann; Andre Bresan

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Collaboration

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Andre Bresan

Carl Zeiss AG

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Axel Scholz

Carl Zeiss AG

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Claudia Ekstein

Carl Zeiss AG

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Holger Kierey

Carl Zeiss AG

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Holger Maltor

Carl Zeiss AG

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Johannes Lippert

Carl Zeiss AG

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Johannes Wangler

Carl Zeiss AG

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Martin Weiser

Carl Zeiss AG

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Michael Layh

Carl Zeiss AG

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Nils Haverkamp

Carl Zeiss AG

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