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Hiromichi Enami

Hitachi

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Publication

Featured researches published by Hiromichi Enami.

Archive | 2003

Plasma processing system and apparatus and a sample processing method

Toshio Masuda; Tatehito Usui; Mitsuru Suehiro; Hiroshi Kanekiyo; Hideyuki Yamamoto; Kazue Takahashi; Hiromichi Enami

Archive | 1999

Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same

Jun Sugiura; Osamu Tsuchiya; Makoto Ogasawara; Fumio Ootsuka; Kazuyoshi Torii; Isamu Asano; Nobuo Owada; Mitsuaki Horiuchi; Tsuyoshi Tamaru; Hideo Aoki; Nobuhiro Otsuka; Seiichirou Shirai; Masakazu Sagawa; Yoshihiro Ikeda; Masatoshi Tsuneoka; Toru Kaga; Tomotsugu Shimmyo; Hidetsugu Ogishi; Osamu Kasahara; Hiromichi Enami; Atsushi Wakahara; Hiroyuki Akimori; Sinichi Suzuki; Keisuke Funatsu; Yoshinao Kawasaki; Tunehiko Tubone; Takayoshi Kogano; Ken Tsugane

Archive | 1996

Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same

Jun Murata; Yoshitaka Tadaki; Hiroko Kaneko; Toshihiro Sekiguchi; Hiroyuki Uchiyama; Hisashi Nakamura; Toshio Maeda; Osamu Kasahara; Hiromichi Enami; Atsushi Ogishima; Masaki Nagao; Michimasa Funabashi; Yasuo Kiguchi; Masayuki Kojima; Atsuyoshi Koike; Hiroyuki Miyazawa; Masato Sadaoka; Kazuya Kadota; Tadashi Chikahara; Kazuo Nojiri; Yutaka Kobayashi

Archive | 1988

Semiconductor integrated circuit with dummy pedestals

Yoichi Tamaki; Kiyoji Ikeda; Toru Nakamura; Akihisa Uchida; Toru Koizumi; Hiromichi Enami; Satoru Isomura; Shinji c o Hitachi Aloka Medical Ltd. Nakajima; Katsumi Ogiue; Kaoru Ohgaya

Archive | 1993

Etching method and etching apparatus therefor

Yasushi Gotoh; Tokuo Kure; Hiroshi Kawakami; Masanori Katsuyama; Kiyomi Yagi; Hiromichi Enami

Archive | 1992

Method and equipment for plasma processing

Hiromichi Enami; Kiyomi Yagi; Masanori Katsuyama; Akihiko Konno

Archive | 1995

Plasma generator with mode restricting means

Yutaka Kakehi; Yoshinao Kawasaki; Keizo Suzuki; Kazuo Nojiri; Hiromichi Enami; Tetsunori Kaji; Seiichi Watanabe; Yoshifumi Ogawa

Archive | 1994

Removing damage caused by plasma etching and high energy implantation using hydrogen

Hiromichi Enami; Kiyomi Katsuyama; Masanori Katsuyama

Archive | 1993

Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves

Yutaka Kakehi; Yoshinao Kawasaki; Keizo Suzuki; Kazuo Nojiri; Hiromichi Enami; Tetsunori Kaji; Seiichi Watanabe; Yoshifumi Ogawa

Archive | 2001

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP EXPOSED THROUGH A CONNECTING HOLE, A TRANSITION-METAL FILM IN THE CONNECTING HOLE AND AN ALUMINUM WIRING STRIP THEREOVER, AND A TRANSITION-METAL NITRIDE FILM BETWEEN THE ALUMINUM WIRING STRIP AND THE TRANSITION-METAL FILM

Jun Sugiura; Osamu Tsuchiya; Makoto Ogasawara; Fumio Ootsuka; Kazuyoshi Torii; Isamu Asano; Nobuo Owada; Mitsuaki Horiuchi; Tsuyoshi Tamaru; Hideo Aoki; Nobuhiro Otsuka; Seiichirou Shirai; Masakazu Sagawa; Yoshihiro Ikeda; Masatoshi Tsuneoka; Toru Kaga; Tomotsugu Shimmyo; Hidetsugu Ogishi; Osamu Kasahara; Hiromichi Enami; Atsushi Wakahara; Hiroyuki Akimori; Sinichi Suzuki; Keisuke Funatsu; Yoshinao Kawasaki; Tunehiko Tubone; Takayoshi Kogano; Ken Tsugane

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Collaboration

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Yoshinao Kawasaki

Hitachi

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Kazuo Nojiri

Hitachi

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Keizo Suzuki

Hitachi

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Seiichi Watanabe

Hitachi

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Tetsunori Kaji

Hitachi

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Yoshifumi Ogawa

Hitachi

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Yutaka Kakehi

Hitachi

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Osamu Kasahara

Hitachi

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Atsushi Wakahara

Hitachi

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Fumio Ootsuka

Hitachi

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