Is this you? Create Your Porfile
Avatar

Hung-Eil Kim

Advanced Micro Devices

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Hung-Eil Kim is active.

Explore More

Publication

Featured researches published by Hung-Eil Kim.

Lithography for semiconductor manufacturing. Conference | 2001

ArF lithography: challenges, resolution capability, and the mask error enhancement function (MEEF)

Marina V. Plat; Christopher F. Lyons; Amada Wilkison; Jeff A. Schefske; Hung-Eil Kim

Early insertion of ArF nm lithography will occur at the 130 nm node in 2001. Process development for the 100nm node will also occur this year. Both aggressive gate length reductions and minimum pitch design rules below 250nm present immediate challenges for the new ArF technology. Gate line widths will approach one half of the wavelength of the exposure system.

Archive | 2004

Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results

Cyrus E. Tabery; Chris Haidinyak; Todd P. Lukanc; Luigi Capodieci; Carl P. Babcock; Hung-Eil Kim; Christopher A. Spence

Archive | 2007

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

Cyrus E. Tabery; Todd P. Lukanc; Chris Haidinyak; Luigi Capodieci; Carl P. Babcock; Hung-Eil Kim; Christopher A. Spence

Archive | 2004

Method of verifying an optical proximity correction (OPC) model

Hung-Eil Kim

Archive | 2005

System and method for fabricating contact holes

Anna Maria Minvielle; Cyrus E. Tabery; Hung-Eil Kim; Jongwook Kye

Archive | 2004

System and method for design rule creation and selection

Todd P. Lukanc; Cyrus E. Tabery; Luigi Capodieci; Carl P. Babcock; Hung-Eil Kim; Christopher A. Spence; Chris Haidinyak

Archive | 2001

Method to improve accuracy of model-based optical proximity correction

Hung-Eil Kim; Carl P. Babcock

Archive | 2004

Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin

Todd P. Lukanc; Cyrus E. Tabery; Luigi Capodieci; Carl P. Babcock; Hung-Eil Kim; Christopher A. Spence; Chris Haidinyak

Archive | 2003

Accurate contact critical dimension measurement using variable threshold method

Hung-Eil Kim

Archive | 2004

Two mask photoresist exposure pattern for dense and isolated regions

Ramkumar Subramanian; Scott A. Bell; Todd P. Lukanc; Marina V. Plat; Uzodinma Okoroanyanwu; Hung-Eil Kim

Explore More

Collaboration

Dive into the Hung-Eil Kim's collaboration.

Top Co-Authors
Avatar

Carl P. Babcock

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Todd P. Lukanc

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Chris Haidinyak

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Christopher A. Spence

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Cyrus E. Tabery

GlobalFoundries

View shared research outputs
Top Co-Authors
Avatar

Luigi Capodieci

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Marina V. Plat

Advanced Micro Devices

View shared research outputs
Top Co-Authors
Avatar

Cyrus E. Tabery

GlobalFoundries

View shared research outputs
Top Co-Authors
Avatar

Jongwook Kye

GlobalFoundries

View shared research outputs
Top Co-Authors
Avatar

Anna Maria Minvielle

Advanced Micro Devices

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge