Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Irene McStay is active.

Publication


Featured researches published by Irene McStay.


Archive | 2000

Negative Ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation

Rama Divakaruni; Stephan Kudelka; Helmut Tews; Irene McStay; K. Y. Lee; Uwe Schroeder


Archive | 2001

Process flow for capacitance enhancement in a DRAM trench

Michael P. Chudzik; Johnathan E. Faltermeier; Rajarao Jammy; Stephan Kudelka; Irene McStay; Kenneth T. Settlemyer; Helmut Tews


Archive | 2000

Method of forming self-limiting polysilicon LOCOS for DRAM cell

Ramachandra Divakaruni; Jack A. Mandelman; Irene McStay; Larry Alan Nesbit; Carl J. Radens; Helmut Tews


Archive | 2003

SACRIFICIAL COLLAR METHOD FOR IMPROVED DEEP TRENCH PROCESSING

Michael P. Chudzik; Irene McStay; Helmut Tews; Porshia Shane Wrschka


Archive | 2001

Method for surface area enhancement of capacitors by film growth and self masking

Rajarao Jammy; Irene McStay; Byeongju Park; Joseph F. Shepard; Helmut Tews


Archive | 2002

Low resistivity deep trench fill for DRAM and EDRAM applications

Uwe Schroeder; Helmut Tews; Irene McStay; Manfred Hauf; Matthias Goldbach; Bernhard Sell; Harald Seidl; Dirk Schumann; Rajarao Jammy; Joseph F. Shepard; Jean-Marc Rousseau


Archive | 2003

Nitride and polysilicon interface with titanium layer

Ronald Joseph Schutz; Werner Robl; Rajeev Malik; Lawrence A. Clevenger; Oleg Gluschenkov; Cyril Cabral; Roy C. Iggulden; Yun-Yu Wang; Keith Kwong Hon Wong; Irene McStay


Archive | 2002

RTCVD process and reactor for improved conformality and step-coverage

Ashima B. Chakravarti; Oleg Gluschenkov; Irene McStay


Archive | 2001

METHOD FOR SURFACE ROUGHNESS ENHANCEMENT IN SEMICONDUCTOR CAPACITOR MANUFACTURING

Stephen Rahn; Irene McStay; Helmut Tews; Uwe Schroeder; Stephan Kudelka; Rajarao Jammy


Archive | 2000

Semi-insulating diffusion barrier for low-resistivity gate conductors

Lawrence A. Clevenger; Jack A. Mandelman; Rajarao Jammy; Oleg Gluschenkov; Irene McStay; Kwong-Hon Wong; Jonathan Faltermeier

Researchain Logo
Decentralizing Knowledge