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Featured researches published by Isao Miyanaga.


IEEE Transactions on Semiconductor Manufacturing | 1993

Failure analysis of ULSI circuits using photon emission

Yukiharu Uraoka; Isao Miyanaga; Kazuhiko Tsuji; Shigenobu Akiyama

A real-time failure analysis technique for ULSI circuits using photon emission is proposed. This technique utilizes a photon detection system combined with a circuit tester. Improved failure detection is achieved because the tester can bias arbitrary blocks in the ULSI chip. Detecting and correct process defects and design errors improves the reliability of the ULSI chip. >


Archive | 1999

Semiconductor wafer package, method and apparatus for connecting testing IC terminals of semiconductor wafer and probe terminals, testing method of a semiconductor integrated circuit, probe card and its manufacturing method

Yoshirou Nakata; Toshio Yamada; Atsushi Fujiwara; Isao Miyanaga; Shin Hashimoto; Yukiharu Uraoka; Yasushi Okuda; Kenzou Hatada


Archive | 2004

Method of forming insulating film and method of fabricating semiconductor device

Kazuichiro Itonaga; Akihiro Yamamoto; Hiroaki Nakaoka; Isao Miyanaga; Yoshinao Harada


Archive | 1998

Probe sheet and method of manufacturing the same

Isao Miyanaga


Archive | 1994

Probe card and its manufacture

Shin Hashimoto; Isao Miyanaga; Yoshiro Nakada; Yasushi Okuda; Yukiharu Uraoka; 義朗 中田; 寧 奥田; 績 宮永; 伸 橋本; 行治 浦岡


Archive | 2001

Method of forming insulation film, and method of manufacturing semiconductor device

Yoshihisa Harada; Soichiro Itonaga; Isao Miyanaga; Hiroaki Nakaoka; Akihiro Yamamoto; 弘明 中岡; 佳尚 原田; 績 宮永; 明広 山本; 総一郎 糸長


Archive | 1998

MANUFACTURE OF PROBE CARD

Shin Hashimoto; Isao Miyanaga; Yoshiro Nakada; Yasushi Okuda; Yukiharu Uraoka; 義朗 中田; 寧 奥田; 績 宮永; 伸 橋本; 行治 浦岡


Archive | 1993

Method of fabricating capacitor or contact for semiconductor device by forming uneven oxide film and reacting silicon with metal containing gas

Shuji Hirao; Hisashi Ogawa; Yuka Terai; Mitsuru Sekiguchi; M. Fukumoto; Isao Miyanaga


Archive | 1994

Method for extending electrically conductive layer into electrically insulating layer

Isao Miyanaga; Yasushi Okuda


Archive | 1996

Semiconductor device which reduces the minimum distance requirements between active areas

Mizuki Segawa; Isao Miyanaga; Toshiki Yabu; Takashi Nakabayashi; Takashi Uehara; Kyoji Yamashita; Takaaki Ukeda; Masatoshi Arai; Takayuki Yamada; Michikazu Matsumoto

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