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Dive into the research topics where Jens Reichelt is active.

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Featured researches published by Jens Reichelt.


Proceedings of SPIE, the International Society for Optical Engineering | 2007

Performance comparison of techniques for intra-field CD control improvement

Rainer Pforr; Mario Hennig; Jens Reichelt; Guy Ben Zvi; Martin Sczyrba

Intra-field CD variation is a main contributor to the total CD variation budget in IC manufacturing. It is essentially caused by mask CD variations and imperfections of the exposure tool. Techniques to reduce the IF CD error will be introduced. Tool and mask based CDU improvement techniques will be compared. Their CDU improvement potential and their correction accuracy will be analyzed. The correction methodology will be discussed, specifically none-wafer based CD measurement techniques as correction data input. Implementation efforts of the techniques will be compared.


Archive | 2006

Positioning error correction process for structural element on substrate involves finding lateral position, comparing with preset one and applying light beam dose

Eric Cotte; Mario Hennig; Rainer Pforr; Jens Reichelt; Martin Sczyrba


Archive | 2007

Method and System for Adjusting an Optical Model

Rainer Pforr; Thorsten Winkler; Ralf Ziebold; Wolfram Kostler; Jens Reichelt; Stefan Blawid; Sebastian Champigny; Manuel Vorwerk


Storage and Retrieval for Image and Video Databases | 2006

Image degradation due to phase effects in chromeless phase lithography

Karsten Bubke; Martin Sczyrba; Kyi Tae Park; Ralf Neubauer; Rainer Pforr; Jens Reichelt; Ralf Ziebold


Archive | 2006

Method and system for photolithography

Rainer Pforr; Mario Hennig; Jens Reichelt; Thomas Muelders


Archive | 2006

Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element

Rainer Pforr; Jens Reichelt; Mario Hennig; Thomas Mülders; Karsten Zeiler


Archive | 2007

Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography

Mario Hennig; Rainer Pforr; Jens Reichelt


Archive | 2008

Verfahren und System für die Fotolithografie

Mario Hennig; Thomas Muelders; Rainer Pforr; Jens Reichelt


Archive | 2006

Photomask assembly, optical imaging system method for determining the lattice parameters and absorption properties of a diffractive optical element and method for manufacturing a diffractive optical element

Mario Hennig; Thomas Mülders; Rainer Pforr; Jens Reichelt; Karsten Zeiler


Archive | 2006

Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements Photomask assembly, optical imaging system method for determining the lattice parameters and absorption properties for a diffractive optical element and method for manufacturing a diffractive optical element

Mario Hennig; Thomas Mülders; Rainer Pforr; Jens Reichelt; Karsten Zeiler

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