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Featured researches published by Katsuhiko Kurumada.


Japanese Journal of Applied Physics | 1986

Observation of Room Temperature Current Oscillation in InGaAs/InAlAs MQW Pin Diodes

Yuichi Kawamura; Koichi Wakita; H. Asahi; Katsuhiko Kurumada

Oscillatory behavior of current in the forward current-voltage characteristics for InGaAs/InAlAs multiple quantum well pin diodes was observed at room temperature for the first time. This oscillation became extremely clear at low temperature (80 K), and the oscillatory bias voltage region shrank with decreasing the well numbers.


Japanese Journal of Applied Physics | 1983

N+ Self-Aligned MESFET for GaAs LSIs

Kimiyoshi Yamasaki; Kazuyoshi Asai; Katsuhiko Kurumada

The SAINT (Self-Aligned Implantation for N+-layer Technology) procers can embed n+- layers with very low resistance at a controlled distance from Schottky gate. It has been experimentally ascertained that the SAINT has feasibility for GaAs LSIs with advantages of gain, speed, uniformity and stability. An optimum n+-gate spacing in view of resistance-capacitance trade-off is found by combination of experiments and two-dimensional simulation. Guiding principles for the submicron gate are quantitatively discussed with results of the simulation.


Japanese Journal of Applied Physics | 1983

A Large Barrier Height Schottky Contact between Amorphous Si-Ge-B and GaAs

Masamitsu Suzuki; Katsumi Murase; Kazuyoshi Asai; Katsuhiko Kurumada

Electrical properties of contacts between amorphous Si–Ge–B and GaAs are studied. A Schottky contact with a barrier height as large as 0.99 V has been realized. The barrier height can be varied by changing the composition of the amorphous films. Amorphous Si–Ge–B is applied to GaAs FETs as gate electrodes. A large saturated drain current of 900 µA/10 µm gate width has been realized. This value is 1.88 times as large as conventional normally-off GaAs MESFETs.


Japanese Journal of Applied Physics | 1981

P-Column Gate Field Effect Transistor

Kazuyoshi Asai; Yasunobu Ishii; Yasuhiro Kawasaki; Katsuhiko Kurumada

Normally-off GaAs FETs with p-columns as the gate were fabricated. The transconductance exhibited considerably high value associated with relatively smaller sacrifice of the gate capacitance increase. The propagation delay of 145 ps/gate was observed from the ring oscillator made of 6 µm width devices with 2 µm column diameter dissipating 441 µW/gate.


Archive | 1980

Field effect transistor with combination Schottky-junction gate

Yasunobu Ishii; Kazuyoshi Asai; Katsuhiko Kurumada


Archive | 1982

Method of manufacturing a FET device disposed in a compound s/c layer on a semi-insulating substrate

Kazuyoshi Asai; Yasunobu Ishii; Katsuhiko Kurumada


Japanese Journal of Applied Physics | 1968

Preparation of Germanium Nitride Films on the Stained Germanium Crystal Surface

Yoshitaka Igarashi; Katsuhiko Kurumada; Tatsuya Niimi


Archive | 1980

Field effects semiconductor devices

Katsuhiko Kurumada; Kazuyoshi Asai; Yasunobu Ishii


Archive | 1988

FIELD EFFECT TRANSISTOR FOR INTEGRATED CIRCUITS

Katsuhiko Kurumada; Katsumi Murase; Kazuyoshi Asai; Masamitsu Suzuki; Yoshihito Amemiya; Toshio Ogino; Yoshihiko Mizushima


Japanese Journal of Applied Physics | 1974

Field Profiles in Tapered Planar Gunn Devices

Katsuhiko Kurumada

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Kazuyoshi Asai

Nippon Telegraph and Telephone

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Yoshihiko Mizushima

Nippon Telegraph and Telephone

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Yuichi Kawamura

Osaka Prefecture University

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