Kazuhiro Hirano
Nikon
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Publication
Featured researches published by Kazuhiro Hirano.
Proceedings of SPIE, the International Society for Optical Engineering | 2009
Kazuhiro Hirano; Yuichi Shibazaki; Masato Hamatani; Jun Ishikawa; Yasuhiro Iriuchijima
Double patterning (DP), an extension of immersion, is the leading contender for the manufacturing of 32 nm half pitch node devices. For DP, substantial improvement in overlay accuracy is required to meet the CDU requirements for the 32 nm node, and substantial increase in throughput is required to meet the cost requirements. To meet these challenges, Nikon introduced the NSR-S620. The S620 is based on the Streamlign platform, which is characterized by three innovations: Birds Eye Control, Stream Alignment, and Modular2 Structure. In addition, many of the current systems and techniques have been refined to meet the requirements for DP. This presentation will discuss these technological improvements and show the latest technical results.
Archive | 2003
Pai-Hsueh Yang; Bausan Yuan; Susumu Makinouchi; Yoshiji Itakura; Kazuhiro Hirano; Hideyuki Hashimoto; Ryoichi Kawaguchi
Archive | 2010
Yuichi Shibazaki; Akira Okutomi; Kazuhiro Hirano
Archive | 2004
Pai-Hsueh Yang; Kazuhiro Hirano; Ping-Wei Chang; Tim Teng; Bausan Yuan
Archive | 2007
Pai-Hsueh Yang; Bausan Yuan; Kazuo Masaki; Kazuhiro Hirano; Xiao-Feng Yang; Scott Coakley; Michael B. Binnard
Archive | 2004
Pai Hsueh Yang; Tim Teng; Kazuhiro Hirano; Bausan Yuan
Archive | 2011
Pai-Hsueh Yang; Scott Coakley; Michael B. Binnard; Kazuhiro Hirano; Bausan Yuan; Shiang-Lung Koo
Archive | 2005
Yi-ping Hsin; Gabor D. Szoboszlay; Kazuhiro Hirano; Kazuo Masaki; Christopher B. Smith; Ryoichi Kawaguchi; Bausan Yuan
Archive | 2015
Pai-Hsueh Yang; Takakuni Goto; Kazuhiro Hirano
Archive | 2014
Pai-Hsueh Yang; Narutaka Yanagiya; Takakuni Goto; Tsutomu Ogiwara; Kazuhiro Hirano
