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Dive into the research topics where Ken Oowada is active.

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Featured researches published by Ken Oowada.


international solid state circuits conference | 2007

A 56-nm CMOS 99-

Ken Takeuchi; Yasushi Kameda; Susumu Fujimura; Hiroyuki Otake; Koji Hosono; Hitoshi Shiga; Yoshihisa Watanabe; Takuya Futatsuyama; Yoshihiko Shindo; Masatsugu Kojima; Makoto Iwai; Masanobu Shirakawa; Masayuki Ichige; Kazuo Hatakeyama; Shinichi Tanaka; Teruhiko Kamei; Jia-Yi Fu; Adi Cernea; Yan Li; Masaaki Higashitani; Gertjan Hemink; Shinji Sato; Ken Oowada; Shih-Chung Lee; Naoki Hayashida; Jun Wan; Jeffrey W. Lutze; Shouchang Tsao; Mehrdad Mofidi; Kiyofumi Sakurai

A single 3.3-V only, 8-Gb NAND flash memory with the smallest chip to date, 98.8 mm2, has been successfully developed. This is the worlds first integrated semiconductor chip fabricated with 56-nm CMOS technologies. The effective cell size including the select transistors is 0.0075 mum2 per bit, which is the smallest ever reported. To decrease the chip size, a very efficient floor plan with one-sided row decoder, one-sided page buffer, and one-sided pad is introduced. As a result, an excellent 70% cell area efficiency is realized. The program throughput is drastically improved to twice as large as previously reported and comparable to binary memories. The best ever 10-MB/s programming is realized by increasing the page size from 4kB to 8kB. In addition, noise cancellation circuits and the dual VDD-line scheme realize both a small die size and a fast programming. An external page copy achieves a fast 93-ms block copy, efficiently using a 1-MB block size


international solid-state circuits conference | 2006

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Ken Takeuchi; Yasushi Kameda; Susumu Fujimura; Hiroyuki Otake; Koji Hosono; Hitoshi Shiga; Y. Watanabe; Takuya Futatsuyama; Yoshihiko Shindo; Masatsugu Kojima; Makoto Iwai; Masanobu Shirakawa; Masayuki Ichige; Kazuo Hatakeyama; Sumio Tanaka; Teruhiko Kamei; Jia-Yi Fu; Adi Cernea; Yan Li; Masaaki Higashitani; Gertjan Hemink; Shinji Sato; Ken Oowada; Shih-Chung Lee; N. Hayashida; Jun Wan; Jeffrey W. Lutze; Shouchang Tsao; Mehrdad Mofidi; Kiyofumi Sakurai

Fabricated in 56nm CMOS technology, an 8Gb multi-level NAND Flash memory occupies 98.8mm2, with a memory cell size of 0.0075mum/b. The 10MB/s programming and 93ms block copy are also realized by introducing 8kB page, noise-cancellation circuits, external page copy and the dual VDD scheme enabling efficient use of 1MB blocks


international solid-state circuits conference | 2012

8-Gb Multi-Level NAND Flash Memory With 10-MB/s Program Throughput

Yan Li; Seungpil Lee; Ken Oowada; Hao Nguyen; Qui Nguyen; Nima Mokhlesi; Cynthia Hsu; Jason Li; Venky Ramachandra; Teruhiko Kamei; Masaaki Higashitani; Tuan Pham; Mitsuaki Honma; Yoshihisa Watanabe; Kazumi Ino; Binh Le; Byungki Woo; Khin Htoo; Tai-Yuan Tseng; Long Pham; Frank Tsai; Kwang-ho Kim; Yi-Chieh Chen; Min She; Jong Yuh; Alex Chu; Chen Chen; Ruchi Puri; Hung-Szu Lin; Yi-Fang Chen

This paper addresses challenges with improvements made over previous NAND generations to achieve high performance while maintaining a low fail-bit count (FBC) and cost savings from an improved architecture and tightly packed peripheral circuits. Air gap [2,3] technology further improves write throughput by reducing neighbor interference and WL RC. A toggle mode 400Mb/s I/O interface reduces system overhead and enhances overall performance.


Archive | 2005

A 56nm CMOS 99mm2 8Gb Multi-level NAND Flash Memory with 10MB/s Program Throughput

Gerrit Jan Hemink; Ken Oowada


Archive | 2006

128Gb 3b/cell NAND flash memory in 19nm technology with 18MB/s write rate and 400Mb/s toggle mode

Jun Wan; Jeffrey W. Lutze; Masaaki Higashitani; Gerrit Jan Hemink; Ken Oowada; Jian Chen; Geoffrey S. Gongwer


Archive | 2010

Method for programming non-volatile memory with reduced program disturb using modified pass voltages

Ken Oowada; Yingda Dong; Deepanshu Dutta


international solid-state circuits conference | 2009

Selective application of program inhibit schemes in non-volatile memory

Yan Li; Seungpil Lee; Yupin Fong; Feng Pan; Tien-Chien Kuo; Jongmin Park; Tapan Samaddar; Hao Thai Nguyen; Man L. Mui; Khin Htoo; Teruhiko Kamei; Masaaki Higashitani; Emilio Yero; Gyuwan Kwon; Phil Kliza; Jun Wan; Tetsuya Kaneko; Hiroshi Maejima; Hitoshi Shiga; Makoto Hamada; Norihiro Fujita; Kazunori Kanebako; Eugene Tam; Anne Koh; Iris Lu; Calvin Chia-Hong Kuo; Trung Pham; Jonathan Huynh; Qui Nguyen; Hardwell Chibvongodze


Archive | 2006

Extra dummy erase pulses after shallow erase-verify to avoid sensing deep erased threshold voltage

Ken Oowada


Archive | 2013

A 16 Gb 3-Bit Per Cell (X3) NAND Flash Memory on 56 nm Technology With 8 MB/s Write Rate

Yingda Dong; Ken Oowada; Cynthia Hsu


Archive | 2011

Self-boosting system with suppression of high lateral electric fields

Yan Li; Cynthia Hsu; Ken Oowada

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