Kenichi Shimomura
Mitsubishi Electric
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Publication
Featured researches published by Kenichi Shimomura.
IEEE Transactions on Electron Devices | 1998
Takahisa Eimori; Toshiyuki Oashi; Fukashi Morishita; Toshiaki Iwamatsu; Yasuo Yamaguchi; Fumihiro Okuda; Kenichi Shimomura; Hiroki Shimano; Narumi Sakashita; Kazutami Arimoto; Yasuo Inoue; Shinji Komori; M. Inuishi; Tadashi Nishimura; H. Miyoshi
The newly designed scheme for a low-voltage 16 MDRAM/SOI has been successfully realized and the functional DRAM operation has been obtained at very low supply voltage below 1 V. The key process and circuit technologies for low-voltage/high-speed SOI-DRAM will be described here. The extra low voltage DRAM technologies are composed of the modified MESA isolation without parasitic MOS operation, the dual gate SOI-MOSFETs with tied or floating bodies optimized for DRAM specific circuits, the conventional stacked capacitor with increased capacitance by thinner dielectric film, and the other bulk-Si compatible DRAM structure. Moreover, a body bias control technique was applied for body-tied MOSFETs to realize high performance even at low voltage. Integrating the above technologies in the newly designed 0.5-/spl mu/m 16 MDRAM, high-speed DRAM operation of less than 50 ns has been obtained at low supply voltage of 1 V.
electronic imaging | 2003
Yasuyuki Endo; Yoshikazu Nitta; Hiroshi Kubo; Takeshi Murao; Kenichi Shimomura; Masatoshi Kimura; Kenji Watanabe; Satoshi Yamamoto; Shinji Komori
We present a development of a high image quality color VGA CMOS image sensor with 4-micron pixel pitch, especially focusing on reduction of image lag. In order to eliminate image lag, improvement of charge transfer efficiency from photodiode (PD) to floating diffusion (FD) is a key point. We implemented two novel techniques for this purpose. The first technical point is an optimum design of pixel layout, which provides both high fill factor and a large channel width of transfer gate transistor (TG). We achieved both high fill factor of 42% without microlens and large TG channel width of 1.79um, which is 2.4 times larger than the minimum channel width allowed by design rule. The second technical point is a new device structure of TG by a novel Boron implantation process. This brings a wide path of charge transfer from PD to FD. High-quality images with low image lag, less than 0.75%, were obtained. Moreover, we also achieved a CMOS image sensor with high-temperature operability. In order to stabilize an adequate black level, we developed a new scheme of a black level control that adjusts offset voltages of amplifiers with feedback signal from analog-digital converter (ADC). An adequate black level was realized up to 100 degrees centigrade for a 5.6-micron pitch monochrome CIF sensor.
Archive | 2007
Yutaka Abe; Kenichi Shimomura; Kenji Watanabe; 研一 下邨; 研二 渡邉; 豊 阿部
Archive | 2007
Yutaka Abe; Kenichi Shimomura; Kenji Watanabe; 研一 下邨; 研二 渡邉; 豊 阿部
Archive | 2007
Masayuki Hirota; Masafumi Murakami; Kenichi Shimomura; Kenji Watanabe; 研一 下邨; 正幸 弘田; 雅史 村上; 研二 渡邉
Unknown Journal | 1996
T. Oashi; Takahisa Eimori; Fukashi Morishita; Toshiaki Iwamatsu; Yasuo Yamaguchi; Fumihiro Okuda; Kenichi Shimomura; Hiroki Shimano; Narumi Sakashita; Kazutami Arimoto; Yoshinori Inoue; Shinji Komori; M. Inuishi; Tadashi Nishimura; H. Miyoshi
Archive | 2010
Yutaka Abe; Toshiaki Hiraoka; Yusuke Shimizu; Kenichi Shimomura; 研一 下邨; 利章 平岡; 祐介 清水; 豊 阿部
Archive | 2010
Toshiaki Hiraoka; 平岡利章; Kenichi Shimomura; 下邨研一; Yutaka Abe; 阿部豊; Yusuke Shimizu; 清水祐介
Archive | 2010
Toshiaki Hiraoka; 平岡利章; Kenichi Shimomura; 下邨研一; Yutaka Abe; 阿部豊; Yusuke Shimizu; 清水祐介
Archive | 2008
Masashi Murakami; Kenji Watanabe; Masayuki Hirota; Kenichi Shimomura