Martin Antoni

EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

The radiation emitted from an EUV source is collected and focused by a suitable collector system. A reflective blazed grating is used in -1st diffraction order to select a definite spectral band around 13.5 nm wavelength from the broad-band emission spectrum of the source. The effective grating area is segmented into a set of different plane gratings, mounted on a common base plate. In order to focus the light from the collector system, the grating segments are tilted and form a best-fit polygon surface. A specific groove density variation on the grating segments significantly improves the imaging performance. In this paper, we report on design, fabrication and testing of the grating system.

Illumination optics design for EUV lithography

In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a flys-eye integrator. A comparison is given and the potentials of the different solutions are outlined.

EUV collectors: design, development, fabrication, and testing

EUV sources are designed to emit radiation around 13.5 nm wavelength into a solid angle of up to 2π sr. With a suitable Wolter type 1 grazing incidence optic such EUV photons can be collected with high efficiency and focussed onto a preferred target. Such Wolter type 1 collectors are characterized by densely nested concentric and confocal mirror shells with fixed distance from the source and the intermediate image. In this paper we will report on optical and mechanical design, development, fabrication and testing of nested Wolter type 1 collectors, capable of collecting and imaging EUV photons at 13.5 nm wavelength with high efficiency.

Very sensitive real-time inline process mass spectrometer based on FFT Ion Trap technique

In this work, we introduce a new, very fast and extremely sensitive inline process mass spectrometry technique based on Fourier-Transform 3D-Quadrupole Ion Trap technology. With this new technology, we have successfully detected sub-ppbV AsH3 and single digit pptV B2H6 dopants in H2 process gases within seconds. Real-time inline measurement at a CVD chamber showed that our technology was capable to detect reaction products, contaminations on the wafer holder and dopant memory effects in real-time. In contrast to typical residual gas analyzers, our new 3D-Quadrupole Ion Trap did not show mass discrimination with increasing m/z-ratio and was therefore capable to detect large molecules with very low concentrations.