Vadim Yevgenyevich Banine

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Archive | 2001

Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

Johannes Hubertus Josephina Moors; Vadim Yevgenyevich Banine; Martinus Hendrikus Antonius Leenders; Henri Gerard Cato Werij; Hugo Matthieu Visser; Gerrit-Jan Heerens; Erik Leonardus Ham; Hans Meiling; Erik Roelof Loopstra; Sjoerd Nicolaas Lambertus Donders

Archive | 2005

Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination

Wolfgang Singer; Martin Antoni; Johannes Wangler; Markus Weiss; Vadim Yevgenyevich Banine; Marcel Dierichs; Roel Moors; Karl Heinz Schuster; Axel Scholz; Philipp Bosselmann; Bernd Warm

Archive | 2002

Illumination system that suppresses debris from a ligh source

Wolfgang Singer; Martin Antoni; Johannes Wangler; Wilhelm Egle; Vadim Yevgenyevich Banine; Erik Roelof Loopstra

Archive | 2003

Illumination system for a wavelength = 193 nm, comprising sensors for determining the illumination

Wolfgang Singer; Martin Antoni; Johannes Wangler; Markus Weiss; Vadim Yevgenyevich Banine; Marcel Mathijs Theodore Marie Dierichs; Roel Moors; Karl-Heinz Schuster

Archive | 2002

Illumination system with a plurality of individual gratings

Wolfgang Singer; Markus Weiss; Bernd Kleemann; Karlfried Osterried; Johannes Wangler; Frank Melzer; Andreas Heisler; Vadim Yevgenyevich Banine

Archive | 2001

Lithographic projection apparatus and mask handling device

Vadim Yevgenyevich Banine; Sjoerd Nicolaas Lambertus Donders; Erik Leonardus Ham; Gerrit-Jan Heerens; Martinus Hendrikus Antonius Leenders; Erok Roelof Loopstra; Hans Meiling; Johannes Hubertus Josephina Moors; Hugo Matthieu Visser; Henri Gerard Cato Werij

Archive | 2005

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

Wolfgang Singer; Martin Antoni; Johannes Wangler; Markus Weiss; Vadim Yevgenyevich Banine; Marcel Dierichs; Roel Moors; Karl Heinz Schuster; Axel Scholz; Philipp Bosselmann; Bernd Warm

Archive | 2001

Flat projector, manufacturing method for element and element manufactured thereby

Vadim Yevgenyevich Banine; Wilhelmus C Keur; Mark Kroon; Erik Roelof Loopstra; Johannes Hubertus Josephina Moors; Der Laan Hans Van; Der Werf Jan Evert Van; コルネリスケウルヴィルヘルムス; ロエロフロープシュトラエリク; ファンデルラーンハンス; イエフゲニエビッチバニネファディム; クローンマルク; エフェルトファンデルヴェルフヤン; ウベルトウスヨゼフィナモールスヨナネス

Archive | 2008

Extreme UV-projection illumination system for microlithographic imaging, has spectral filter detachably arranged in spectral aperture and/or aperture diaphragm and transparent for extreme UV-radiation

Vadim Yevgenyevich Banine; Günther Dengel; Dirk Heinrich Dr. Ehm; Johannes Hubertus Josephina Moors; A.M. Yakunin

Archive | 2005

Lithographic apparatus, system and device manufacturing method

Marc Hubertus Lorenz Van Der Velden; Vadim Yevgenyevich Banine; Bastiaan Matthias Mertens; Johannes Hubertus Josephina Moors; Markus Weiss; Michiel David Nijkerk

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