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Dive into the research topics where Frank Melzer is active.

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Featured researches published by Frank Melzer.


Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications | 2004

EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

Holger Kierey; Klaus Heidemann; Bernd Kleemann; Renate Winters; Wilhelm Egle; Wolfgang Singer; Frank Melzer; Rutger Wevers; Martin Antoni

The radiation emitted from an EUV source is collected and focused by a suitable collector system. A reflective blazed grating is used in -1st diffraction order to select a definite spectral band around 13.5 nm wavelength from the broad-band emission spectrum of the source. The effective grating area is segmented into a set of different plane gratings, mounted on a common base plate. In order to focus the light from the collector system, the grating segments are tilted and form a best-fit polygon surface. A specific groove density variation on the grating segments significantly improves the imaging performance. In this paper, we report on design, fabrication and testing of the grating system.


Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications | 2004

EUV collectors: design, development, fabrication, and testing

Wilhelm Egle; Wolfgang Hafner; Axel Matthes; Eral Erzin; Bernhard Gaenswein; Herbert Schwarz; Piotr Marczuk; Martin Antoni; Wolfgang Singer; Frank Melzer; Joachim Hainz

EUV sources are designed to emit radiation around 13.5 nm wavelength into a solid angle of up to 2π sr. With a suitable Wolter type 1 grazing incidence optic such EUV photons can be collected with high efficiency and focussed onto a preferred target. Such Wolter type 1 collectors are characterized by densely nested concentric and confocal mirror shells with fixed distance from the source and the intermediate image. In this paper we will report on optical and mechanical design, development, fabrication and testing of nested Wolter type 1 collectors, capable of collecting and imaging EUV photons at 13.5 nm wavelength with high efficiency.


Archive | 2004

Facet mirror having a number of mirror facets

Hubert Holderer; Andreas Heisler; Wolfgang Singer; Markus Weiss; Andreas Seifert; Frank Melzer; Heinz Mann; Jürgen Faltus; Berndt Warm; Stefan Dornheim


Archive | 2001

Optical element deformation system

Frank Melzer; Michael Mühlbeyer; Bernhard Gellrich; Franz Sorg; Stefan Xalter; Thomas Ittner


Archive | 2003

Lighting system, particularly for use in extreme ultraviolet (EUV) lithography

Frank Melzer; Wolfgang Singer


Archive | 2003

Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm

Wolfgang Singer; Wilhelm Egle; Markus Weiss; Joachim Hainz; Jochen Wietzorrek; Frank Melzer; Johannes Wangler


Archive | 2004

Collector with fastening devices for fastening mirror shells

Wolfgang Singer; Wilhelm Egle; Markus Weiss; Joachim Hainz; Joachim Wietzorrek; Johannes Wangler; Frank Melzer; Bernhard Gellrich; Bernhard Geuppert; Erich Schubert; Martin Antoni


Archive | 2001

Precision positioning apparatus for positioning a component especially an optical component

Frank Melzer; Martin Bayer


Archive | 2003

Focusing-device for the radiation from a light source

Martin Antoni; Frank Melzer; Andreas Seifert; Wolfgang Singer


Archive | 2007

Collector configured of mirror shells

Wolfgang Singer; Wilhelm Egle; Markus Weiss; Joachim Hainz; Jochen Wietzorrek; Frank Melzer; Johannes Wangler

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