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Featured researches published by Masao Kawamura.


Japanese Journal of Applied Physics | 1998

The Analysis of the Defective Cells Induced by COP in a 0.3-micron-technology Node DRAM

Masaya Muranaka; Kazuya Makabe; Masashi Miura; Hideaki Kato; Seihachi Ide; Hidetoshi Iwai; Masao Kawamura; Yoshitaka Tadaki; Masamichi Ishihara; Toshiyuki Kaeriyama

The influence of a crystal originated pit (COP) on the deep sub-micron dynamic-random-access-memory (DRAM), was clarified by the investigation of the defective memory cells using 0.3 microns process test-element-group (TEG) which can operate as an actual DRAM. COP constrains the growth of field oxide film and leads to degradation of the isolation characteristics between the adjacent memory cells.


Archive | 1990

Wafer scale of full wafer memory system, packaging method thereof, and wafer processing method employed therein

Masanori Tazunoki; Hiromitsu Mishimagi; Makoto Homma; Toshiyuki Sakuta; Hisashi Nakamura; Keiji Sasaki; Minoru Enomoto; Toshihiko Satoh; Kunizo Sahara; Shigeo Kuroda; Kanji Otsuka; Masao Kawamura; Hinoko Kurosawa; Kazuya Ito


Archive | 1986

Isolation regions formed by locos followed with groove etch and refill

Akihisa Uchida; Daisuke Okada; Toshihiko Takakura; Katsumi Ogiue; Yoichi Tamaki; Masao Kawamura


Journal of The Electrochemical Society | 1988

Evaluation of Dislocation Generation in U‐Groove Isolation

Yoichi Tamaki; Seiichi Isomae; Kazuhiko Sagara; Tokuo Kure; Masao Kawamura


international electron devices meeting | 1982

U-groove isolation technique for high speed bipolar VLSI's

A. Hayasaka; Yoichi Tamaki; Masao Kawamura; Katsumi Ogiue; S. Ohwaki


Archive | 1988

Process of manufacturing semiconductor integrated circuit device and product formed thereby

Mikinori Kawaji; Toshihiko Takakura; Akihisa Uchida; Shigeo Kuroda; Yoichi Tamaki; Takeo Shiba; Kazuhiko Sagara; Masao Kawamura


Archive | 1987

Semiconductor IC with dual groove isolation

Mikinori Kawaji; Toshihiko Takakura; Akihisa Uchida; Shigeo Kuroda; Yoichi Tamaki; Takeo Shiba; Kazuhiko Sagara; Masao Kawamura


Archive | 1975

Epitaxial growth process for compound semiconductor crystals in liquid phase

Masao Kawamura; Kazuhiro Ito; Makoto Morioka; Yuichi Ono; Sachio Ishioka; Kazuhiro Kurata


Archive | 1991

PROCESS OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING TRENCH AND FIELD ISOLATION REGIONS

Mikinori Kawaji; Toshihiko Takakura; Akihisa Uchida; Shigeo Kuroda; Yoichi Tamaki; Takeo Shiba; Kazuhiko Sagara; Masao Kawamura


Archive | 1975

Light emitting semiconductor device and a method for making the same

Yuichi Ono; Kazuhiro Kurata; Masao Kawamura; Makoto Morioka; Kazuhiro Ito

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