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Matthias Kroenke

Infineon Technologies

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Publication

Featured researches published by Matthias Kroenke.

Archive | 2001

Semiconductor memory used especially as a ferroelectric random access memory has capacitor devices each vertically extending from a substrate and/or a passivating region and/or a surface region

Matthias Kroenke; Rainer Bruchhaus; Gerhard Enders; Walter Hartner; Thomas Mikolajick; Nicolas Nagel; Michael Roehner

Archive | 2000

Production of a capacitor arrangement used for an FeRAM storage device comprises filling exposed intermediate regions of the substrate with an electrically insulating intermediate layer up to the level of an capacitor device

Walter Hartner; Volker Weinrich; Matthias Kroenke

Archive | 2001

Production of a semiconductor memory used as an FeRAM memory comprises forming a semiconductor substrate, a passivating region and/or a surface region, forming capacitor arrangements, and providing contact regions or plug regions

Matthias Kroenke; Rainer Bruchhaus; Gerhard Enders; Walter Hartner; Thomas Mikolajick; Nicolas Nagel; Michael Roehner

Archive | 2001

Manufacturing method of semiconductor memory device esp. chain-FeRAM store, involves forming passivation zone and surface zone from this extending mainly vertically in structure

Rainer Bruchhaus; Gerhard Enders; Walter Hartner; Matthias Kroenke; Thomas Mikolajick; Nicolas Nagel; Michael Roehner

Archive | 2006

Method for processing structured surface

Thomas Dittkrist; Werner Graf; Matthias Kroenke; グラーフ ヴェルナー; ディットクリスト トーマス; クレンケ マティアス

Archive | 2003

Method for producing ferroelectric capacitors and integrated semiconductor memory chips

Igor Kasko; Matthias Kroenke; Thomas Mikolajick

Archive | 2002

Method for the production of an integrated circuit

Wolfgang Gustin; Kae-Horng Wang; Matthias Kroenke

Archive | 2001

Production of a ferroelectric capacitor in integrated semiconductor storage chips comprises forming an adhesion layer in a region containing ferroelectric capacitors, exposing the adhesion layer and converting into an insulating layer

Igor Kasko; Matthias Kroenke; Thomas Mikolajick

Archive | 2006

Method of treating a structured surface

Matthias Kroenke; Thomas Dittkrist; Werner Graf

Archive | 2005

Fabrication of connection contacts of semiconductors for future nanotechnologies including deposition of contact layer on masking layer during later back polishing stage

Matthias Kroenke; Joachim Patzer

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Walter Hartner

Infineon Technologies

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Igor Kasko

Infineon Technologies

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Thomas Mikolajick

Dresden University of Technology

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Gerhard Enders

Infineon Technologies

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Guenther Schindler

Infineon Technologies

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Michael Roehner

Infineon Technologies

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Nicolas Nagel

Infineon Technologies

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Rainer Bruchhaus

Infineon Technologies

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Kae-Horng Wang

Infineon Technologies

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Volker Weinrich

Infineon Technologies

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